| dc.contributor.advisor | L. Rafael Reif. | en_US |
| dc.contributor.author | Yu, Lock See | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. | en_US |
| dc.date.accessioned | 2005-08-05T21:05:27Z | |
| dc.date.available | 2005-08-05T21:05:27Z | |
| dc.date.copyright | 1985 | en_US |
| dc.date.issued | 1985 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/15310 | |
| dc.description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1985. | en_US |
| dc.description | MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE. | en_US |
| dc.description | Includes bibliographical references. | en_US |
| dc.description.statementofresponsibility | by Lock See Yu. | en_US |
| dc.format.extent | 94 leaves | en_US |
| dc.format.extent | 4160148 bytes | |
| dc.format.extent | 4159909 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Materials Science and Engineering. | en_US |
| dc.title | The effect of low energy ion bombardment on the crystallographic orientation of thin films | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.S. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.identifier.oclc | 13782745 | en_US |
