Advanced Search

Wafer surface cleaning for silicon homoepitaxy with and without ECR hydrogen plasma exposure

Research and Teaching Output of the MIT Community

Files in this item

Name Size Format Description
32147490.pdf 8.365Mb PDF Preview, non-printable (open to all)
32147490-MIT.pdf 8.383Mb PDF Full printable version (MIT only)

This item appears in the following Collection(s)