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Workfunction Tuning of n-Channel MOSFETs Using Interfacial Yttrium Layer in Fully Silicided Nickel Gate

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dc.contributor.author Yu, Hongpeng
dc.contributor.author Pey, Kin Leong
dc.contributor.author Choi, Wee Kiong
dc.contributor.author Chi, D.Z.
dc.contributor.author Fitzgerald, Eugene A.
dc.contributor.author Antoniadis, Dimitri A.
dc.date.accessioned 2007-01-31T16:13:17Z
dc.date.available 2007-01-31T16:13:17Z
dc.date.issued 2007-01
dc.identifier.uri http://hdl.handle.net/1721.1/35833
dc.description.abstract Continual scaling of the CMOS technology requires thinner gate dielectric to maintain high performance. However, when moving into the sub-45 nm CMOS generation, the traditional poly-Si gate approach cannot effectively reduce the gate thickness further due to the poly-depletion effect. Fully silicided Ni metal gate (FUSI) has been proven to be a promising solution. Ni FUSI metal gate can significantly reduce gate-line sheet resistance, eliminate boron penetration to channels and has good process compatibility with high-k gate dielectric. But Ni FUSI has a mid-gap workfunction which is not suitable for high-performance CMOS applications where the band-edge workfunction is required. In this paper, we propose to tune the nickel (Ni) fully silicided metal gate (FUSI) workfunction via an yttrium/Si/Ni gate stack structure. The workfunction of such structure indicates that the Y interlayer can effectively tune the Ni FUSI workfunction from the mid gap to the conduction band edge of silicon by controlling the interlayer thickness. The gate stack workfunction starts to saturate to the pure yttrium value when the yttrium interlayer is >1.6 nm. This indicates the chemical potential of the material adjacent to gate electrode/gate insulator plays an important role in the determination of the workfunction. en
dc.description.sponsorship Singapore-MIT Alliance (SMA) en
dc.format.extent 629684 bytes
dc.format.mimetype application/pdf
dc.language.iso en en
dc.relation.ispartofseries Advanced Materials for Micro- and Nano-Systems (AMMNS) en
dc.subject Metal Gate en
dc.subject FUSI en
dc.subject Ni Silicidation en
dc.title Workfunction Tuning of n-Channel MOSFETs Using Interfacial Yttrium Layer in Fully Silicided Nickel Gate en
dc.type Article en


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