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Qualification of a medium current ion implantation system in a semiconductor production environment

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Qualification of a medium current ion implantation system in a semiconductor production environment

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Author: Joung, Sandra K. (Sandra Kyongmee)
Department: Massachusetts Institute of Technology. Dept. of Materials Science and Engineering
Publisher: Massachusetts Institute of Technology
Date Issued: 1996
Description:
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.Includes bibliographical references (p. 50-51).
URI: http://hdl.handle.net/1721.1/40220
Keywords: Materials Science and Engineering

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