| dc.contributor.advisor | Lionel C. Kimerling. | en_US |
| dc.contributor.author | Joung, Sandra K. (Sandra Kyongmee) | en_US |
| dc.date.accessioned | 2008-02-04T21:05:15Z | |
| dc.date.available | 2008-02-04T21:05:15Z | |
| dc.date.copyright | 1996 | en_US |
| dc.date.issued | 1996 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/40220 | |
| dc.description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996. | en_US |
| dc.description | Includes bibliographical references (p. 50-51). | en_US |
| dc.description.statementofresponsibility | by Sandra K. Joung. | en_US |
| dc.format.extent | 51 p. | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Materials Science and Engineering | en_US |
| dc.title | Qualification of a medium current ion implantation system in a semiconductor production environment | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.S. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.identifier.oclc | 35953984 | en_US |
