dc.contributor.advisor | John Vander Sande. | en_US |
dc.contributor.author | Hubert, Brian Norio | en_US |
dc.date.accessioned | 2008-03-27T18:46:30Z | |
dc.date.available | 2008-03-27T18:46:30Z | |
dc.date.copyright | 1996 | en_US |
dc.date.issued | 1996 | en_US |
dc.identifier.uri | http://hdl.handle.net/1721.1/41025 | |
dc.description | Thesis (S.B. and S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996. | en_US |
dc.description | Includes bibliographical references (leaves 73-77). | en_US |
dc.description.abstract | In this work, a number of YBa2Cu3Ox-7 (YBCO) superconductor deposition systems developed by various laboratories are subjected to a critical review and analysis. Deficiencies in the design of these deposition processes, and deficiencies in the design of the mechanisms and tools used to carry out these processes are identified. Most of these deficiencies have resulted in either poor end-product performance or unlikely commercial viability. For example: pulsed laser deposition systems are capable of producing very high quality YBCO superconducting films, but their deposition rates are too slow to be commercially viable; liquidsource MOCVD systems can be precisely controlled, but the solvents they require tend to kill superconducting oxides; and solid-source MOCVD systems suffer from imprecise process control, thermal degradation of precursor materials, or both. A simple and affordable MOCVD system, called ConBrio, is proposed as an alternative to existing deposition systems. | en_US |
dc.description.statementofresponsibility | by Brian Norio Hubert. | en_US |
dc.format.extent | 77 leaves | en_US |
dc.language.iso | eng | en_US |
dc.publisher | Massachusetts Institute of Technology | en_US |
dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
dc.subject | Mechanical Engineering | en_US |
dc.title | Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films | en_US |
dc.type | Thesis | en_US |
dc.description.degree | S.B.and S.M. | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | en_US |
dc.identifier.oclc | 42996973 | en_US |