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dc.contributor.advisorJohn Vander Sande.en_US
dc.contributor.authorHubert, Brian Norioen_US
dc.date.accessioned2008-03-27T18:46:30Z
dc.date.available2008-03-27T18:46:30Z
dc.date.copyright1996en_US
dc.date.issued1996en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/41025
dc.descriptionThesis (S.B. and S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996.en_US
dc.descriptionIncludes bibliographical references (leaves 73-77).en_US
dc.description.abstractIn this work, a number of YBa2Cu3Ox-7 (YBCO) superconductor deposition systems developed by various laboratories are subjected to a critical review and analysis. Deficiencies in the design of these deposition processes, and deficiencies in the design of the mechanisms and tools used to carry out these processes are identified. Most of these deficiencies have resulted in either poor end-product performance or unlikely commercial viability. For example: pulsed laser deposition systems are capable of producing very high quality YBCO superconducting films, but their deposition rates are too slow to be commercially viable; liquidsource MOCVD systems can be precisely controlled, but the solvents they require tend to kill superconducting oxides; and solid-source MOCVD systems suffer from imprecise process control, thermal degradation of precursor materials, or both. A simple and affordable MOCVD system, called ConBrio, is proposed as an alternative to existing deposition systems.en_US
dc.description.statementofresponsibilityby Brian Norio Hubert.en_US
dc.format.extent77 leavesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectMechanical Engineeringen_US
dc.titleNovel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin filmsen_US
dc.typeThesisen_US
dc.description.degreeS.B.and S.M.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.identifier.oclc42996973en_US


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