Variation reduction in a wafer fabrication line through inspection optimization
Citable URI:
http://hdl.handle.net/1721.1/43446
| Title: | Variation reduction in a wafer fabrication line through inspection optimization |
| Author: | Bean, John W. (John Wellard) |
| Advisor: | Tom Eagar, Roy Welsch. |
| Department: | Massachusetts Institute of Technology. Dept. of Materials Science and Engineering; Sloan School of Management |
| Publisher: | Massachusetts Institute of Technology |
| Issue Date: | 1997 |
| Description: |
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997, and Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1997. Includes bibliographical references (p. 44). |
| URI: | http://hdl.handle.net/1721.1/43446 |
| Keywords: | Materials Science and Engineering, Sloan School of Management |
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