Nanostructures, Technology, Research, and Applications
Citable URI:
http://hdl.handle.net/1721.1/57366
| Title: | Nanostructures, Technology, Research, and Applications |
| Author: | Smith, Henry I.; Goodberlet, James G.; Ferrera, Juan; Mondol, Mark K.; Carter, David J.; Carter, James M.; Daley, James M.; Lim, Michael H. Y.; Moon, Euclid E.; Schweizer, Mark R.; Mao, Wendy; Murphy, Edward R.; Yang, Isabel Y.; Yuan, Jing; Everett, Patrick N.; Farhoud, Maya S.; Fleming, Robert C., Jr.; Savas, Timothy A.; Schattenburg, Mark L.; Jackson, Keith M.; Antoniadis, Dimitri A.; Lochtefeld, Anthony; Chandrakasan, Anantha P.; Meinhold, Mitchell W.; Sokolinski, Ilia; Melloch, Michael R.; Orlando, Terry P.; Pepin, Anne; Berman, David B.; Ashoori, Raymond C.; Foresi, James S.; Villeneuve, Pierre R.; Joannopoulos, John D.; Kimerling, Lionel C.; Damask, Jay N.; Murphy, Thomas E.; Haus, Hermann A.; Kolodziejski, Leslie A.; Porter, Jeanne M.; Prentiss, Jane D.; Sisson, Robert D.; van Beek, Joost; Canizares, Claude R.; Franke, Andrea E. |
| Publisher: | Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT) |
| Issue Date: | 1996-01-01 |
| Description: | Contains reports on twenty research projects and a list of publications. |
| URI: | http://hdl.handle.net/1721.1/57366 |
| Other Identifiers: | RLE_PR_139_01_02s_04 |
| Is Part Of | Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1996 Solid State Physics, Electronics and Optics Quantum-Effect Devices Nanostructures, Technology, Research, and Applications |
| Series/Report no.: | Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 139 |
| Keywords: | Nanostructures, Technology, Research, and Applications, NanoStructures Laboratory, Scanning-Electron-Beam Lithography, Spatial-Phase-Locked Electron-Beam Lithography, X-Ray Nanolithography, Improved Mask Technology for X-Ray Lithography, High-Precision Mask Alignment with Immunity to Overlayers, High-Precision Gapping System with Immunity to Overlayers, Interferometric Lithography, High-Performance Sub-100 nm MOSFETs using X-ray Lithography, Back-gated CMOS on SOI Active Substrates, Fabrication of T-gate Devices Using X-ray Lithography, Coulomb Charging Effects in Semiconductor Nanostructures, Coulomb Charging Tunneling in Semiconductor Nanostructures, Fabrication Studies of Lateral Surface Superlattices in GaAs/AIGaAs Modulation Doped Field-Effect Transistors, Transport Studies of Lateral Surface Superlattices in GaAs/AIGaAs Modulation Doped Field-Effect Transistors, Single-Electron Transistor Research, One-Dimensional Photonic Band Gap Devices in SOI Waveguides, Fabrication of Grating-Based Optical Filters, Integrated Optical Grating-Based Matched Filters for Fiber-Optic Communications, High-Dispersion, High-Efficiency Transmission Gratings for Astrophysical X-ray Spectroscopy, Submicrometer-Period Transmission Gratings for X-ray Spectroscopy, Submicrometer-Period Transmission Gratings for X-ray Interferometry, Submicrometer-Period Transmission Gratings for Atom-Beam Spectroscopy, Submicrometer-Period Transmission Gratings for Atom-Beam Interferometry, Super-smooth X-ray Reflection Gratings, Transmission Gratings as UV-blocking Filters for Neutral Atom Imaging |
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| RLE_PR_139_01_02s_04.pdf | 28.93Mb |
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