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Fabricating silicon germanium waveguides by low pressure chemical vapor deposition

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dc.contributor.advisor Eugene A. Fitzgerald. en_US
dc.contributor.author Berlin, Dean Edward, 1978- en_US
dc.contributor.other Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. en_US
dc.date.accessioned 2005-08-23T20:05:58Z
dc.date.available 2005-08-23T20:05:58Z
dc.date.copyright 2002 en_US
dc.date.issued 2002 en_US
dc.identifier.uri http://hdl.handle.net/1721.1/8427
dc.description Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2002. en_US
dc.description Includes bibliographical references (p. 110-112). en_US
dc.description.statementofresponsibility by Dean Edward Berlin. en_US
dc.format.extent 119 p. en_US
dc.format.extent 9002922 bytes
dc.format.extent 9002681 bytes
dc.format.mimetype application/pdf
dc.format.mimetype application/pdf
dc.language.iso eng en_US
dc.publisher Massachusetts Institute of Technology en_US
dc.rights M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. en_US
dc.rights.uri http://dspace.mit.edu/handle/1721.1/7582
dc.subject Materials Science and Engineering. en_US
dc.title Fabricating silicon germanium waveguides by low pressure chemical vapor deposition en_US
dc.type Thesis en_US
dc.description.degree S.M. en_US
dc.contributor.department Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. en_US
dc.identifier.oclc 50633021 en_US


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