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Study of gold diffusion kinetics in p/p+ epitaxial silicon

dc.contributor.advisorLionel C. Kimerling.en_US
dc.contributor.authorWu, Edward C. (Edward Chang-Hung), 1976-en_US
dc.date.accessioned2005-08-19T12:00:00Zen_US
dc.date.available2005-08-19T12:00:00Zen_US
dc.date.copyright1998en_US
dc.date.issued1998en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/10146
dc.descriptionThesis (B.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1998.en_US
dc.descriptionIncludes bibliographical references (leaf 34).en_US
dc.description.statementofresponsibilityby Edward C. Wu.en_US
dc.format.extent35, [9] leavesen_US
dc.format.extent2447293 bytes
dc.format.extent2447054 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineeringen_US
dc.titleStudy of gold diffusion kinetics in p/p+ epitaxial siliconen_US
dc.typeThesisen_US
dc.description.degreeB.S.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc39960272en_US


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