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dc.contributor.authorKamboj, Varun S.
dc.contributor.authorBraeuninger-Weimer, Philipp
dc.contributor.authorJessop, David S.
dc.contributor.authorSingh, Angadjit
dc.contributor.authorSibik, Juraj
dc.contributor.authorRen, Yuan
dc.contributor.authorHofmann, Stephan
dc.contributor.authorZeitler, J. Axel
dc.contributor.authorBeere, Harvey E.
dc.contributor.authorRitchie, David A.
dc.contributor.authorKidambi, Piran Ravichandran
dc.date.accessioned2018-04-09T20:01:10Z
dc.date.available2018-04-09T20:01:10Z
dc.date.issued2016-02
dc.identifier.urihttp://hdl.handle.net/1721.1/114643
dc.description.abstractWe report the characterization of centimeter sized graphene field-effect transistors with ionic gating which enables active frequency and amplitude modulation of terahertz (THz) radiation. Chemical vapour deposited graphene with different grain sizes were studied using THz time-domain spectroscopy. We demonstrate that the plasmonic resonances intrinsic to graphene can be tuned over a wide range of THz frequencies by engineering the grain size of the graphene. Further frequency tuning of the resonance, up to ∼65 GHz, is achieved by electrostatic doping via ionic gating. These results present the first demonstration of tuning the intrinsic plasmonic resonances in graphene.en_US
dc.description.sponsorshipEngineering and Physical Sciences Research Council (Grant EP/J017671/1)en_US
dc.description.sponsorshipEngineering and Physical Sciences Research Council (Grant EP/K016636/1-GRAPHTED)en_US
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1117/12.2209724en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleLow-bias gate tunable terahertz plasmonic signatures in chemical vapour deposited graphene of varying grain sizeen_US
dc.typeArticleen_US
dc.identifier.citationKamboj, Varun S., et al. "Low-Bias Gate Tunable Terahertz Plasmonic Signatures in Chemical Vapour Deposited Graphene of Varying Grain Size." Proceedings Volume 9747, Terahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications IX, 13-18 February, 2016, San Francisco, California, edited by Laurence P. Sadwick and Tianxin Yang, 2016, p. 974707. © 2016 SPIEen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorKidambi, Piran Ravichandran
dc.relation.journalProceedings Volume 9747, Terahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications IX;en_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dc.date.updated2018-03-16T15:58:20Z
dspace.orderedauthorsKamboj, Varun S.; Braeuninger-Weimer, Philipp; Kidambi, Piran R.; Jessop, David S.; Singh, Angadjit; Sibik, Juraj; Ren, Yuan; Hofmann, Stephan; Zeitler, J. Axel; Beere, Harvey E.; Ritchie, David A.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0003-1546-5014
mit.licensePUBLISHER_POLICYen_US


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