Polymer photochemistry at the EUV wavelength
Author(s)
Fedynyshyn, Theodore H.; Goodman, Russell B.; Cabral, Alberto; Tarrio, Charles; Lucatorto, Thomas B.
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The higher energy associated with extreme ultraviolet (EUV) radiation coupled with the high absorptivity of most organic polymers at these wavelengths should lead to increased excited state population and higher quantum yields of photoproducts. Polymers representative of those commonly employed in resists as well as some model polymers were selected for this study. Polymer photochemistry at EUV was catalogued as to the effect of absorbed 13.4-nm radiation on a polymer's quantum yield of chain scission (Φs) and crosslinking (Φx). In selected cases, the chain scission and crosslinking quantum yields were also compared to those previously determined at 157-, 193- and 248-nm. It was found that quantum yield values were over a magnitude greater at EUV relative to optical wavelengths.
Date issued
2010-03Department
Lincoln LaboratoryJournal
Proceedings of SPIE--the International Society for Optical Engineering
Publisher
SPIE
Citation
Theodore H. Fedynyshyn, Russell B. Goodman, Alberto Cabral, Charles Tarrio and Thomas B. Lucatorto, "Polymer photochemistry at the EUV wavelength", Proc. SPIE 7639, 76390A (2010); doi:10.1117/12.845997 © 2010 COPYRIGHT SPIE
Version: Final published version
ISSN
0277-786X