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dc.contributor.authorSmalley, Daniel E.
dc.contributor.authorMcLaughlin, Stephen
dc.contributor.authorLeach, Christopher
dc.contributor.authorKimball, Jacob
dc.contributor.authorBove, V. Michael, Jr.
dc.contributor.authorJolly, Sunny
dc.date.accessioned2016-03-28T18:58:27Z
dc.date.available2016-03-28T18:58:27Z
dc.date.issued2015-08
dc.date.submitted2015-04
dc.identifier.issn1932-5150
dc.identifier.issn1932-5134
dc.identifier.urihttp://hdl.handle.net/1721.1/101897
dc.description.abstractWe give a summary of the progress we have made in the fabrication of guided wave devices for use in holographic video displays. This progress includes identifying anisotropic leaky-mode modulators as a platform for holographic display, the development of a characterization apparatus to extract key parameters from leaky-mode devices, and the identification of optimized waveguide parameters for frequency-controlled color display.en_US
dc.description.sponsorshipUnited States. Air Force Research Laboratory (Contract FA8650-14-C-6571)en_US
dc.language.isoen_US
dc.publisherSPIEen_US
dc.relation.isversionofhttp://dx.doi.org/10.1117/1.JMM.14.4.041308en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleProgress on characterization and optimization of leaky-mode modulators for holographic videoen_US
dc.typeArticleen_US
dc.identifier.citationSmalley, Daniel E., Stephen McLaughlin, Christopher Leach, Jacob Kimball, V. Michael Bove, and Sundeep Jolly. “Progress on Characterization and Optimization of Leaky-Mode Modulators for Holographic Video.” Journal of Micro/Nanolithography, MEMS, and MOEMS 14, no. 4 (August 27, 2015): 041308. © 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Media Laboratoryen_US
dc.contributor.departmentProgram in Media Arts and Sciences (Massachusetts Institute of Technology)en_US
dc.contributor.mitauthorBove, V. Michael, Jr.en_US
dc.contributor.mitauthorJolly, Sunnyen_US
dc.relation.journalJournal of Micro/Nanolithography, MEMS, and MOEMSen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsSmalley, Daniel E.; McLaughlin, Stephen; Leach, Christopher; Kimball, Jacob; Bove, V. Michael; Jolly, Sundeepen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-9244-472X
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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