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dc.contributor.authorCanepa, Pieremanuele
dc.contributor.authorMalik, Rahul
dc.contributor.authorJayaraman, Saivenkataraman
dc.contributor.authorRong, Ziqin
dc.contributor.authorZavadil, Kevin R.
dc.contributor.authorPersson, Kristin
dc.contributor.authorCeder, Gerbrand
dc.contributor.authorGopalakrishnan, Sai Gautam
dc.date.accessioned2016-04-15T14:22:14Z
dc.date.available2016-04-15T14:22:14Z
dc.date.issued2015-04
dc.date.submitted2015-04
dc.identifier.issn0897-4756
dc.identifier.issn1520-5002
dc.identifier.urihttp://hdl.handle.net/1721.1/102239
dc.description.abstractMultivalent (MV) battery architectures based on pairing a Mg metal anode with a high-voltage (∼3 V) intercalation cathode offer a realistic design pathway toward significantly surpassing the energy storage performance of traditional Li-ion-based batteries, but there are currently only few electrolyte systems that support reversible Mg deposition. Using both static first-principles calculations and ab initio molecular dynamics, we perform a comprehensive adsorption study of several salt and solvent species at the interface of Mg metal with an electrolyte of Mg[superscript 2+] and Cl[superscript –] dissolved in liquid tetrahydrofuran (THF). Our findings not only provide a picture of the stable species at the interface but also explain how this system can support reversible Mg deposition, and as such, we provide insights in how to design other electrolytes for Mg plating and stripping. The active depositing species are identified to be (MgCl)[superscript +] monomers coordinated by THF, which exhibit preferential adsorption on Mg compared to possible passivating species (such as THF solvent or neutral MgCl[subscript 2] complexes). Upon deposition, the energy to desolvate these adsorbed complexes and facilitate charge transfer is shown to be small (∼61–46.2 kJ mol[superscript –1] to remove three THF from the strongest adsorbing complex), and the stable orientations of the adsorbed but desolvated (MgCl)[superscript +] complexes appear to be favorable for charge transfer. Finally, observations of Mg–Cl dissociation at the Mg surface at very low THF coordinations (0 and 1) suggest that deleterious Cl incorporation in the anode may occur upon plating. In the stripping process, this is beneficial by further facilitating the Mg removal reaction.en_US
dc.description.sponsorshipUnited States. Dept. of Energy. Office of Basic Energy Sciences. Joint Center for Energy Storage Research (Subcontract 3F-31144)en_US
dc.language.isoen_US
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/acs.chemmater.5b00389en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourcearXiven_US
dc.titleUnderstanding the Initial Stages of Reversible Mg Deposition and Stripping in Inorganic Nonaqueous Electrolytesen_US
dc.typeArticleen_US
dc.identifier.citationCanepa, Pieremanuele, Gopalakrishnan Sai Gautam, Rahul Malik, Saivenkataraman Jayaraman, Ziqin Rong, Kevin R. Zavadil, Kristin Persson, and Gerbrand Ceder. “Understanding the Initial Stages of Reversible Mg Deposition and Stripping in Inorganic Nonaqueous Electrolytes.” Chem. Mater. 27, no. 9 (May 12, 2015): 3317–3325.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.mitauthorCanepa, Pieremanueleen_US
dc.contributor.mitauthorGopalakrishnan, Sai Gautamen_US
dc.contributor.mitauthorMalik, Rahulen_US
dc.contributor.mitauthorJayaraman, Saivenkataramanen_US
dc.contributor.mitauthorRong, Ziqinen_US
dc.relation.journalChemistry of Materialsen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsCanepa, Pieremanuele; Gautam, Gopalakrishnan Sai; Malik, Rahul; Jayaraman, Saivenkataraman; Rong, Ziqin; Zavadil, Kevin R.; Persson, Kristin; Ceder, Gerbranden_US
dc.identifier.orcidhttps://orcid.org/0000-0002-8987-8500
dc.identifier.orcidhttps://orcid.org/0000-0002-1303-0976
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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