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dc.contributor.authorSwaminathan, Jaichander
dc.contributor.authorMaswadeh, Laith A.
dc.contributor.authorWarsinger, David Elan Martin
dc.contributor.authorLienhard, John H
dc.date.accessioned2016-05-16T12:19:07Z
dc.date.available2016-05-16T12:19:07Z
dc.date.issued2015-06
dc.date.submitted2015-04
dc.identifier.issn03767388
dc.identifier.urihttp://hdl.handle.net/1721.1/102500
dc.description.abstractSuperhydrophobic surfaces for enhanced condensation in air gap membrane distillation (AGMD) may provide significantly improved distillate production rates and increased thermal efficiency. While AGMD is one of the most thermally efficient membrane distillation desalination configurations, large transport resistances in the air gap limit distillate production rates. AGMD experiments were performed with combinations of untreated, hydrophobic, and superhydrophobic condensation surfaces. A nanostructured copper oxide coated condensing surface produced durable 164°±4° contact angles and jumping droplet condensation. Tests were also performed on the air gap spacer, in this case a small diameter support mesh, to judge the effects of superhydrophobic treatment and conductivity on distillate production for AGMD. A novel visualization technique was implemented to see through PVDF membranes and confirm air gap behavior. The experiments were compared with numerical modeling of AGMD film-wise condensation and flooded-gap MD. The results indicate that the introduction of superhydrophobic surfaces can result in improvements in distillate production in excess of 60% over standard AGMD. However, for high distillate production, condensation on the superhydrophobic plate transitions from a partially wetted droplet morphology to Wenzel flooded (wetting) conditions. Mildly hydrophobic condensing surfaces were found to provide moderate improvement in distillate production. Superhydrophobic support meshes made a negligible difference in distillate production, but high conductivity support meshes showed significant increases in flux at the expense of increased conduction losses. The results outline recommended superhydrophobic condensation conditions at varied feed and cold side temperatures for substantial improvement to distillate production rate for AGMD systems in a flat plate configuration.en_US
dc.description.sponsorshipMasdar Institute of Science and Technology (Massachusetts Institute of Technology Cooperative Agreement 02/MI/MI/CP/11/07633/GEN/G/00)en_US
dc.language.isoen_US
dc.publisherElsevieren_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/j.memsci.2015.05.067en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceProf. Lienhard via Angie Locknaren_US
dc.titleSuperhydrophobic condenser surfaces for air gap membrane distillationen_US
dc.typeArticleen_US
dc.identifier.citationWarsinger, David E.M., Jaichander Swaminathan, Laith A. Maswadeh, and John H. Lienhard V. “Superhydrophobic Condenser Surfaces for Air Gap Membrane Distillation.” Journal of Membrane Science 492 (October 2015): 578–587.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Abdul Latif Jameel World Water & Food Security Laben_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.approverLienhard, John H.en_US
dc.contributor.mitauthorWarsinger, David Elan Martinen_US
dc.contributor.mitauthorSwaminathan, Jaichanderen_US
dc.contributor.mitauthorMaswadeh, Laith A.en_US
dc.contributor.mitauthorLienhard, John H.en_US
dc.relation.journalJournal of Membrane Scienceen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsWarsinger, David E.M.; Swaminathan, Jaichander; Maswadeh, Laith A.; Lienhard V, John H.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-2901-0638
dc.identifier.orcidhttps://orcid.org/0000-0001-8375-2694
dc.identifier.orcidhttps://orcid.org/0000-0003-3446-1473
mit.licenseOPEN_ACCESS_POLICYen_US


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