Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates
Author(s)
Ross, Caroline A; Alexander-Katz, Alfredo; Bai, Wubin; Gadelrab, Karim Raafat
Downloadmanuscript-revised-unmarked.pdf (3.406Mb)
PUBLISHER_POLICY
Publisher Policy
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Terms of use
Metadata
Show full item recordAbstract
Perpendicular orientation of lamellar microdomains in a high interaction parameter block copolymer was obtained within high aspect ratio gratings functionalized with a preferential sidewall brush. The experiments used polystyrene-block-polydimethylsiloxane (PS-b-PDMS) with molecular weight 43 kg/mol within trenches made using interference lithography. The perpendicular alignment was obtained for both thermal and solvent annealing, using three different solvent vapors, for a range of film thicknesses and trench widths. A platinum (Pt) layer at the base of the trenches avoided the formation of a wetting layer, giving perpendicular orientation at the substrate surface. The results are interpreted using self-consistent field theory simulation and a Ginzburg–Landau analytic model to map the energies of lamellae of different orientations as a function of the grating aspect ratio and the surface energies of the sidewalls and top and bottom surfaces. The model results agree with the experiment and provide a set of guidelines for obtaining perpendicular microdomains within topographic features.
Date issued
2015-09Department
Massachusetts Institute of Technology. Department of Materials Science and EngineeringJournal
Nano Letters
Publisher
American Chemical Society (ACS)
Citation
Bai, Wubin et al. “Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates.” Nano Letters 15.10 (2015): 6901–6908.
Version: Author's final manuscript
ISSN
1530-6984
1530-6992