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dc.contributor.authorChong, Tzyy Haur
dc.contributor.authorLabban, Omar
dc.contributor.authorLiu, Chang, S.B. Massachusetts Institute of Technology
dc.contributor.authorLienhard, John H
dc.date.accessioned2016-11-28T16:37:03Z
dc.date.available2016-11-28T16:37:03Z
dc.date.issued2016-08
dc.date.submitted2016-06
dc.identifier.issn03767388
dc.identifier.urihttp://hdl.handle.net/1721.1/105440
dc.description.abstractRecently, a novel class of low-pressure nanofiltration (NF) hollow fiber membranes, particularly suited for water softening and desalination pretreatment have been fabricated in-house using layer-by-layer (LbL) deposition with chemical crosslinking. These membranes can operate at exceedingly low pressures (2 bar), while maintaining relatively high rejections of multivalent ions. In spite of their great potential, our understanding as to what makes them superior has been limited, demanding further investigation before any large-scale implementation can be realized. In this study, the Donnan-Steric Pore Model with dielectric exclusion (DSPM-DE) is applied for the first time to these membranes to describe the membrane separation performance, and to explain the observed rejection trends, including negative rejection, and their underlying multi-ionic interactions. Experiments were conducted on a spectrum of feed chemistries, ranging from uncharged solutes to single salts, salt mixtures, and artificial seawater to characterize the membrane and accurately predict its performance. Modeling results were validated with experiments, and then used to elucidate the working principles that underlie the low-pressure softening process. An approach based on sensitivity analysis shows that the membrane pore dielectric constant, followed by the pore size, are primarily responsible for the selectively high rejections of the NF membranes to multivalent ions. Surprisingly, the softening process is found to be less sensitive to changes in membrane charge density. Our findings demonstrate that the unique ability of these membranes to exclusively separate multivalent ions from the solution, while allowing monovalent ions to permeate, is key to making this low-pressure softening process realizable.en_US
dc.description.sponsorshipMassachusetts Institute of Technology (Pappalardo Fellowship)en_US
dc.description.sponsorshipSingapore. National Research Foundation (its Campus for Research Excellence and Technological Enterprise (CREATE) programme)en_US
dc.description.sponsorshipSingapore-MIT Alliance for Research and Technology (SMART) (015824-00194)en_US
dc.language.isoen_US
dc.publisherElsevieren_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/j.memsci.2016.08.062en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceProf. Lienhard via Angie Locknaren_US
dc.titleFundamentals of low-pressure nanofiltration: Membrane characterization, modeling, and understanding the multi-ionic interactions in water softeningen_US
dc.typeArticleen_US
dc.identifier.citationLabban, Omar, Chang Liu, Tzyy Haur Chong, and John H. Lienhard V. “Fundamentals of Low-Pressure Nanofiltration: Membrane Characterization, Modeling, and Understanding the Multi-Ionic Interactions in Water Softening.” Journal of Membrane Science 521 (January 2017): 18-32.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.departmentParsons Laboratory for Environmental Science and Engineering (Massachusetts Institute of Technology)
dc.contributor.approverLienhard, John H.en_US
dc.contributor.mitauthorLabban, Omar
dc.contributor.mitauthorLienhard, John H
dc.relation.journalJournal of Membrane Scienceen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsLabban, Omar; Liu, Chang; Chong, Tzyy Haur; Lienhard, John H.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0003-4167-4186
dc.identifier.orcidhttps://orcid.org/0000-0002-2901-0638
dspace.mitauthor.errortrue
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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