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dc.contributor.authorHill, William Adam
dc.contributor.authorLe Goff, Gaelle
dc.contributor.authorLee, Ji Seok
dc.contributor.authorGupta, Ankur
dc.contributor.authorDoyle, Patrick S
dc.date.accessioned2017-03-16T18:39:26Z
dc.date.available2017-03-16T18:39:26Z
dc.date.issued2015-06
dc.date.submitted2015-05
dc.identifier.issn2198-3844
dc.identifier.urihttp://hdl.handle.net/1721.1/107440
dc.description.abstractHigh-throughput fabrication of graphically encoded hydrogel microparticles is achieved by combining flow contact lithography in a multichannel microfluidic device and a high capacity 25 mm LED UV source. Production rates of chemically homogeneous particles are improved by two orders of magnitude. Additionally, the custom-built contact lithography instrument provides an affordable solution for patterning complex microstructures on surfaces.en_US
dc.description.sponsorshipNovartis Institutes of Biomedical Research. Education Officeen_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Grants CMMI-1120724 and DMR-1006147)en_US
dc.description.sponsorshipUnited States. Army Research Office (Institute for Collaborative Biotechnologies. Grant W911NF-09-0001)en_US
dc.language.isoen_US
dc.publisherWiley Blackwellen_US
dc.relation.isversionofhttp://dx.doi.org/10.1002/advs.201500149en_US
dc.rightsCreative Commons Attribution 4.0 International Licenseen_US
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/en_US
dc.sourceWileyen_US
dc.titleHigh-Throughput Contact Flow Lithographyen_US
dc.typeArticleen_US
dc.identifier.citationLe Goff, Gaelle C. et al. “High-Throughput Contact Flow Lithography.” Advanced Science 2.10 (2015): 1500149.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.contributor.mitauthorLe Goff, Gaelle
dc.contributor.mitauthorLee, Ji Seok
dc.contributor.mitauthorGupta, Ankur
dc.contributor.mitauthorDoyle, Patrick S
dc.relation.journalAdvanced Scienceen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsLe Goff, Gaelle C.; Lee, Jiseok; Gupta, Ankur; Hill, William Adam; Doyle, Patrick S.en_US
dspace.embargo.termsNen_US
mit.licensePUBLISHER_CCen_US
mit.metadata.statusComplete


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