Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation

Author(s)
Perrotta, Alberto; Heinze, Katja; Creatore, Mariadriana; Boscher, Nicolas; Wang, Minghui; ... Show more
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Abstract
The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
Date issued
2016-09
URI
http://hdl.handle.net/1721.1/108287
Department
Massachusetts Institute of Technology. Department of Chemical Engineering
Journal
Advanced Materials
Publisher
Wiley Blackwell
Citation
Boscher, Nicolas D. et al. “Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation.” Advanced Materials 28.34 (2016): 7479–7485.
Version: Author's final manuscript
ISSN
0935-9648
1521-4095
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