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Epitaxial CrN Thin Films with High Thermoelectric Figure of Merit

dc.contributor.authorQuintela, Camilo X.
dc.contributor.authorPodkaminer, Jacob P.
dc.contributor.authorPaudel, Tula R.
dc.contributor.authorThies, Eric L.
dc.contributor.authorHillsberry, Daniel A.
dc.contributor.authorTenne, Dmitri A.
dc.contributor.authorTsymbal, Evgeny Y.
dc.contributor.authorEom, Chang-Beom
dc.contributor.authorRivadulla, Francisco
dc.contributor.authorLuckyanova, Maria N
dc.contributor.authorChen, Gang
dc.date.accessioned2017-05-26T13:31:39Z
dc.date.available2017-05-26T13:31:39Z
dc.date.issued2015-05
dc.date.submitted2015-03
dc.identifier.issn0935-9648
dc.identifier.issn1521-4095
dc.identifier.urihttp://hdl.handle.net/1721.1/109358
dc.description.abstractA large enhancement of the thermoelectric figure of merit is reported in single-crystalline films of CrN. The mechanism of the reduction of the lattice thermal conductivity in cubic CrN is similar to the resonant bonding in IV–VI compounds. Therefore, useful ideas from classic thermo­electrics can be applied to tune functionalities in transition metal nitrides and oxides.en_US
dc.description.sponsorshipSolid-State Solar-Thermal Energy Conversion Center (DE-SC0001299)en_US
dc.description.sponsorshipSolid-State Solar-Thermal Energy Conversion Center (DE-FG02-09ER46577)en_US
dc.language.isoen_US
dc.publisherWiley Blackwellen_US
dc.relation.isversionofhttp://dx.doi.org/10.1002/adma.201500110en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceProf. Chen via Angie Locknaren_US
dc.titleEpitaxial CrN Thin Films with High Thermoelectric Figure of Meriten_US
dc.typeArticleen_US
dc.identifier.citationQuintela, Camilo X.; Podkaminer, Jacob P.; Luckyanova, Maria N.; Paudel, Tula R.; Thies, Eric L.; Hillsberry, Daniel A. andTenne, Dmitri A. et al. “Epitaxial CrN Thin Films with High Thermoelectric Figure of Merit.” Advanced Materials 27, no. 19 (April 2015): 3032–3037 © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheimen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.approverChen, Gangen_US
dc.contributor.mitauthorLuckyanova, Maria N
dc.contributor.mitauthorChen, Gang
dc.relation.journalAdvanced Materialsen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsQuintela, Camilo X.; Podkaminer, Jacob P.; Luckyanova, Maria N.; Paudel, Tula R.; Thies, Eric L.; Hillsberry, Daniel A.; Tenne, Dmitri A.; Tsymbal, Evgeny Y.; Chen, Gang; Eom, Chang-Beom; Rivadulla, Franciscoen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-9676-8783
dc.identifier.orcidhttps://orcid.org/0000-0002-3968-8530
mit.licenseOPEN_ACCESS_POLICYen_US


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