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dc.contributor.authorAlbo, Asaf
dc.contributor.authorHu, Qing
dc.contributor.authorReno, John L.
dc.date.accessioned2017-08-17T17:50:16Z
dc.date.available2017-08-17T17:50:16Z
dc.date.issued2016-08
dc.date.submitted2016-06
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.urihttp://hdl.handle.net/1721.1/110970
dc.description.abstractThe mechanisms that limit the temperature performance of GaAs/Al[subscript 0.15]GaAs-based terahertz quantum cascade lasers (THz-QCLs) have been identified as thermally activated LO-phonon scattering and leakage of charge carriers into the continuum. Consequently, the combination of highly diagonal optical transition and higher barriers should significantly reduce the adverse effects of both mechanisms and lead to improved temperature performance. Here, we study the temperature performance of highly diagonal THz-QCLs with high barriers. Our analysis uncovers an additional leakage channel which is the thermal excitation of carriers into bounded higher energy levels, rather than the escape into the continuum. Based on this understanding, we have designed a structure with an increased intersubband spacing between the upper lasing level and excited states in a highly diagonal THz-QCL, which exhibits negative differential resistance even at room temperature. This result is a strong evidence for the effective suppression of the aforementioned leakage channel.en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.4961617en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAlboen_US
dc.titleRoom temperature negative differential resistance in terahertz quantum cascade laser structuresen_US
dc.typeArticleen_US
dc.identifier.citationAlbo, Asaf, et al. “Room Temperature Negative Differential Resistance in Terahertz Quantum Cascade Laser Structures.” Applied Physics Letters 109, 8 (August 2016): 081102 © 2016 American Institute of Physics (AIP)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.mitauthorAlbo, Asaf
dc.contributor.mitauthorHu, Qing
dc.relation.journalApplied Physics Lettersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsAlbo, Asaf; Hu, Qing; Reno, John L.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-7073-2958
dc.identifier.orcidhttps://orcid.org/0000-0003-1982-4053
mit.licensePUBLISHER_POLICYen_US


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