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dc.contributor.authorYang, Chuanxi
dc.contributor.authorMoriarty, Tom
dc.contributor.authorGordon, Roy G.
dc.contributor.authorBuonassisi, Tonio
dc.contributor.authorSteinmann, Vera
dc.contributor.authorChakraborty, Rupak
dc.contributor.authorRekemeyer, Paul Harlan
dc.contributor.authorHartman, Katherine
dc.contributor.authorBrandt, Riley E
dc.contributor.authorPolizzotti, James Alexander
dc.contributor.authorGradecak, Silvija
dc.date.accessioned2017-09-07T16:25:10Z
dc.date.available2017-09-07T16:25:10Z
dc.date.issued2016-08
dc.date.submitted2016-06
dc.identifier.issn1944-8244
dc.identifier.issn1944-8252
dc.identifier.urihttp://hdl.handle.net/1721.1/111150
dc.description.abstractAs novel absorber materials are developed and screened for their photovoltaic (PV) properties, the challenge remains to reproducibly test promising candidates for high-performing PV devices. Many early-stage devices are prone to device shunting due to pinholes in the absorber layer, producing “false-negative” results. Here, we demonstrate a device engineering solution toward a robust device architecture, using a two-step absorber deposition approach. We use tin sulfide (SnS) as a test absorber material. The SnS bulk is processed at high temperature (400 °C) to stimulate grain growth, followed by a much thinner, low-temperature (200 °C) absorber deposition. At a lower process temperature, the thin absorber overlayer contains significantly smaller, densely packed grains, which are likely to provide a continuous coating and fill pinholes in the underlying absorber bulk. We compare this two-step approach to the more standard approach of using a semi-insulating buffer layer directly on top of the annealed absorber bulk, and we demonstrate a more than 3.5× superior shunt resistance R[subscript sh] with smaller standard error σ[subscript Rsh]. Electron-beam-induced current (EBIC) measurements indicate a lower density of pinholes in the SnS absorber bulk when using the two-step absorber deposition approach. We correlate those findings to improvements in the device performance and device performance reproducibility.en_US
dc.description.sponsorshipUnited States. Department of Energy (EEC-1041895)en_US
dc.description.sponsorshipUnited States. Department of Energy (Contract DE-EE0005329)en_US
dc.language.isoen_US
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/acsami.6b07198en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOther univ. web domainen_US
dc.titleA Two-Step Absorber Deposition Approach To Overcome Shunt Losses in Thin-Film Solar Cells: Using Tin Sulfide as a Proof-of-Concept Material Systemen_US
dc.typeArticleen_US
dc.identifier.citationSteinmann, Vera et al. “A Two-Step Absorber Deposition Approach To Overcome Shunt Losses in Thin-Film Solar Cells: Using Tin Sulfide as a Proof-of-Concept Material System.” ACS Applied Materials & Interfaces 8, 34 (August 2016): 22664–22670 © 2016 American Chemical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorSteinmann, Vera
dc.contributor.mitauthorChakraborty, Rupak
dc.contributor.mitauthorRekemeyer, Paul Harlan
dc.contributor.mitauthorHartman, Katherine
dc.contributor.mitauthorBrandt, Riley E
dc.contributor.mitauthorPolizzotti, James Alexander
dc.contributor.mitauthorGradecak, Silvija
dc.relation.journalACS Applied Materials & Interfacesen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsSteinmann, Vera; Chakraborty, Rupak; Rekemeyer, Paul H.; Hartman, Katy; Brandt, Riley E.; Polizzotti, Alex; Yang, Chuanxi; Moriarty, Tom; Gradečak, Silvija; Gordon, Roy G.; Buonassisi, Tonioen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-6715-5195
dc.identifier.orcidhttps://orcid.org/0000-0002-7043-5048
dc.identifier.orcidhttps://orcid.org/0000-0002-5901-9027
dc.identifier.orcidhttps://orcid.org/0000-0003-2785-552X
dc.identifier.orcidhttps://orcid.org/0000-0002-8723-8024
mit.licensePUBLISHER_POLICYen_US


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