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dc.contributor.authorSchrock, Richard Royce
dc.date.accessioned2018-02-05T15:42:49Z
dc.date.available2018-02-05T15:42:49Z
dc.date.issued2016-08
dc.identifier.issn2374-7943
dc.identifier.issn2374-7951
dc.identifier.urihttp://hdl.handle.net/1721.1/113413
dc.description.abstractThe largest industrial application of olefin metathesis today is the synthesis of propylene from ethylene and butenes(1) employing WO₃ on SiO₂, a relatively long-lived and regenerable catalyst that operates at 350–400 °C. It is widely proposed that high temperatures are required because the percentage of metal sites actually involved in the metathesis reaction is extremely low, or the reaction that generates alkylidenes is not a high yield reaction, or both. A recent paper by Copéret, Mashima, and co-workers(2) tackles head-on the question concerning how in WO₃/SiO₂ catalysts the alkylidene is formed from an olefin alone. Hundreds of papers have attempted to answer this question, although one has to admit that there may not be a single answer for all supported oxide catalysts or all olefins.en_US
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/ACSCENTSCI.6B00223en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceACSen_US
dc.titleReducing Them Down To Charge Them Up: Low Temperature Catalyst Activationen_US
dc.typeArticleen_US
dc.identifier.citationSchrock, Richard R. “Reducing Them Down To Charge Them Up: Low Temperature Catalyst Activation.” ACS Central Science 2, 8 (August 2016): 495–496 © 2016 American Chemical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemistryen_US
dc.contributor.mitauthorSchrock, Richard Royce
dc.relation.journalACS Central Scienceen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2018-02-05T14:09:41Z
dspace.orderedauthorsSchrock, Richard R.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-5827-3552
mit.licensePUBLISHER_POLICYen_US


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