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dc.contributor.authorScipioni, Kane L.
dc.contributor.authorWang, Zhenyu
dc.contributor.authorMaximenko, Yulia
dc.contributor.authorKatmis, Ferhat
dc.contributor.authorSteiner, Charlie
dc.contributor.authorMadhavan, Vidya
dc.date.accessioned2018-04-03T17:42:09Z
dc.date.available2018-04-03T17:42:09Z
dc.date.issued2018-03
dc.date.submitted2017-09
dc.identifier.issn2469-9950
dc.identifier.issn2469-9969
dc.identifier.urihttp://hdl.handle.net/1721.1/114516
dc.description.abstractAlloys of Bi[subscript 2]Te[subscript 3] and Sb[subscript 2]Te[subscript 3][(Bi[subscript 1−x]Sb[subscript x])[subscript 2] Te[subscript 3]] have played an essential role in the exploration of topological surface states, allowing us to study phenomena that would otherwise be obscured by bulk contributions to conductivity. Despite intensive transport and angle resolved photoemission (ARPES) studies, important questions about this system remain unanswered. For example, previous studies reported the chemical tuning of the Fermi level to the Dirac point by controlling the Sb:Bi composition ratio, but the optimum ratio varies widely across various studies. Moreover, it is unclear how the quasiparticle lifetime is affected by the disorder resulting from Sb/Bi alloying. In this work, we use scanning tunneling microscopy and spectroscopy to study the electronic structure of epitaxially grown (Bi,Sb)[subscript 2] Te[subscript 3] thin films at the nanoscale. We study Landau levels (LLs) to determine the effect of disorder on the quasiparticle lifetime as well as the position of the Dirac point with respect to the Fermi energy. A plot of the LL peak widths shows that despite the intrinsic disorder, the quasiparticle lifetime is not significantly degraded. We further determine that the ideal Sb concentration to place the Fermi energy to within a few meV of the Dirac point is x∼0.7, but that postannealing temperatures can have a significant effect on the crystallinity and Fermi level position. Specifically, high postgrowth annealing temperature can result in better crystallinity and surface roughness, but also produces a larger Te defect density which adds n-type carriers. Finally, in combination with quasiparticle interference imaging, the dispersion is revealed over a large energy range above the Fermi energy, in a regime inaccessible to ARPES. Interestingly, the surface state dispersion for the x∼0.7 sample shows great similarity to pristine Bi[subscript 2] Te[subscript 3]. This work provides microscopic information on the role of disorder and composition in determining carrier concentration, surface state dispersion, and quasiparticle lifetime in (Bi[subscript 1−x]Sb[subscript x])[subscript 2] Te[subscript 3].en_US
dc.publisherAmerican Physical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1103/PhysRevB.97.125150en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAmerican Physical Societyen_US
dc.titleRole of defects in the carrier-tunable topological-insulator (Bi[subscript 1 − x]Sb[subscript x])[subscript 2]Te[subscript 3] thin filmsen_US
dc.typeArticleen_US
dc.identifier.citationScipioni, Kane L., et al. “Role of Defects in the Carrier-Tunable Topological-Insulator (Bi[subscript 1 − x]Sb[subscript x])[subscript 2] Te[subscript 3] Thin Films.” Physical Review B, vol. 97, no. 12, Mar. 2018. © 2018 American Physical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Plasma Science and Fusion Centeren_US
dc.contributor.mitauthorKatmis, Ferhat
dc.relation.journalPhysical Review Ben_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2018-03-28T18:00:45Z
dc.language.rfc3066en
dc.rights.holderAmerican Physical Society
dspace.orderedauthorsScipioni, Kane L.; Wang, Zhenyu; Maximenko, Yulia; Katmis, Ferhat; Steiner, Charlie; Madhavan, Vidyaen_US
dspace.embargo.termsNen_US
mit.licensePUBLISHER_POLICYen_US


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