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dc.contributor.authorChen, Hongsheng
dc.contributor.authorZhang, Baile
dc.contributor.authorLin, Xiao
dc.contributor.authorYang, Yi
dc.contributor.authorRivera, Nicholas H.
dc.contributor.authorLopez, Josue Jacob
dc.contributor.authorShen, Yichen
dc.contributor.authorKaminer, Ido Efraim
dc.contributor.authorJoannopoulos, John
dc.contributor.authorSoljacic, Marin
dc.date.accessioned2018-04-06T13:26:07Z
dc.date.available2018-04-06T13:26:07Z
dc.date.issued2017-06
dc.date.submitted2017-02
dc.identifier.issn0027-8424
dc.identifier.issn1091-6490
dc.identifier.urihttp://hdl.handle.net/1721.1/114577
dc.description.abstractA fundamental building block for nanophotonics is the ability to achieve negative refraction of polaritons, because this could enable the demonstration of many unique nanoscale applications such as deep-subwavelength imaging, superlens, and novel guiding. However, to achieve negative refraction of highly squeezed polaritons, such as plasmon polaritons in graphene and phonon polaritons in boron nitride (BN) with their wavelengths squeezed by a factor over 100, requires the ability to flip the sign of their group velocity at will, which is challenging. Here we reveal that the strong coupling between plasmon and phonon polaritons in graphene-BN heterostructures can be used to flip the sign of the group velocity of the resulting hybrid (plasmon-phonon-polariton) modes. We predict allangle negative refraction between plasmon and phonon polaritons and, even more surprisingly, between hybrid graphene plasmons and between hybrid phonon polaritons. Graphene-BN heterostructures thus provide a versatile platform for the design of nanometasurfaces and nanoimaging elements. Keywords: negative refraction; plasmon polariton; phonon polariton; graphene–boron nitride; heterostructureen_US
dc.description.sponsorshipMassachusetts Institute of Technology. Institute for Soldier Nanotechnologies (Contract W911NF-13-D-0001)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Award 1122374)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Award DMR-1419807)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Grant DMR-1419807)en_US
dc.description.sponsorshipUnited States. Department of Energy (Award DE-FG02-97ER25308)en_US
dc.publisherNational Academy of Sciences (U.S.)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1073/PNAS.1701830114en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceNational Academy of Sciencesen_US
dc.titleAll-angle negative refraction of highly squeezed plasmon and phonon polaritons in graphene–boron nitride heterostructuresen_US
dc.typeArticleen_US
dc.identifier.citationLin, Xiao et al. “All-Angle Negative Refraction of Highly Squeezed Plasmon and Phonon Polaritons in Graphene–boron Nitride Heterostructures.” Proceedings of the National Academy of Sciences 14, 26 (June 2017): 6717-6721 © 2017 National Academy of Sciencesen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.mitauthorLin, Xiao
dc.contributor.mitauthorYang, Yi
dc.contributor.mitauthorRivera, Nicholas H.
dc.contributor.mitauthorLopez, Josue Jacob
dc.contributor.mitauthorShen, Yichen
dc.contributor.mitauthorKaminer, Ido Efraim
dc.contributor.mitauthorJoannopoulos, John
dc.contributor.mitauthorSoljacic, Marin
dc.relation.journalProceedings of the National Academy of Sciencesen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2018-03-30T18:26:26Z
dspace.orderedauthorsLin, Xiao; Yang, Yi; Rivera, Nicholas; López, Josué J.; Shen, Yichen; Kaminer, Ido; Chen, Hongsheng; Zhang, Baile; Joannopoulos, John D.; Soljačić, Marinen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0003-2879-4968
dc.identifier.orcidhttps://orcid.org/0000-0001-8855-1330
dc.identifier.orcidhttps://orcid.org/0000-0002-7512-3756
dc.identifier.orcidhttps://orcid.org/0000-0003-2691-1892
dc.identifier.orcidhttps://orcid.org/0000-0002-7244-3682
dc.identifier.orcidhttps://orcid.org/0000-0002-7184-5831
mit.licensePUBLISHER_POLICYen_US


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