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dc.contributor.authorAmano, H
dc.contributor.authorBaines, Y
dc.contributor.authorBeam, E
dc.contributor.authorBorga, Matteo
dc.contributor.authorBouchet, T
dc.contributor.authorChalker, Paul R
dc.contributor.authorCharles, M
dc.contributor.authorChen, Kevin J
dc.contributor.authorChowdhury, Nadim
dc.contributor.authorChu, Rongming
dc.contributor.authorDe Santi, Carlo
dc.contributor.authorDe Souza, Maria Merlyne
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorDi Cioccio, L
dc.contributor.authorEckardt, Bernd
dc.contributor.authorEgawa, Takashi
dc.contributor.authorFay, P
dc.contributor.authorFreedsman, Joseph J
dc.contributor.authorGuido, L
dc.contributor.authorHäberlen, Oliver
dc.contributor.authorHaynes, Geoff
dc.contributor.authorHeckel, Thomas
dc.contributor.authorHemakumara, Dilini
dc.contributor.authorHouston, Peter
dc.contributor.authorHua, Mengyuan
dc.contributor.authorHuang, Qingyun
dc.contributor.authorHuang, Alex
dc.contributor.authorJiang, Sheng
dc.contributor.authorKawai, H
dc.contributor.authorKinzer, Dan
dc.contributor.authorKuball, Martin
dc.contributor.authorKumar, Ashwani
dc.contributor.authorLee, Kean Boon
dc.contributor.authorLi, Xu
dc.contributor.authorMarcon, Denis
dc.contributor.authorMärz, Martin
dc.contributor.authorMcCarthy, R
dc.contributor.authorMeneghesso, Gaudenzio
dc.contributor.authorMeneghini, Matteo
dc.contributor.authorMorvan, E
dc.contributor.authorNakajima, A
dc.contributor.authorNarayanan, E. M. S.
dc.contributor.authorOliver, Stephen
dc.contributor.authorPlissonnier, M
dc.contributor.authorReddy, R
dc.contributor.authorThayne, Iain
dc.contributor.authorTorres, A
dc.contributor.authorTrivellin, Nicola
dc.contributor.authorUnni, V
dc.contributor.authorUren, Michael J
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorWallis, David J
dc.contributor.authorWang, J
dc.contributor.authorXie, J
dc.contributor.authorYagi, S
dc.contributor.authorYang, Shu
dc.contributor.authorYoutsey, C
dc.contributor.authorYu, Ruiyang
dc.contributor.authorZanoni, Enrico
dc.contributor.authorZeltner, Stefan
dc.contributor.authorHu, Jie
dc.contributor.authorPalacios, Tomas
dc.contributor.authorPiedra, Daniel
dc.contributor.authorSun, Min
dc.contributor.authorZhang, Yuhao
dc.date.accessioned2018-05-29T18:21:17Z
dc.date.available2018-05-29T18:21:17Z
dc.date.issued2018-03
dc.date.submitted2017-10
dc.identifier.issn0022-3727
dc.identifier.issn1361-6463
dc.identifier.urihttp://hdl.handle.net/1721.1/115941
dc.description.abstractGallium nitride (GaN) is a compound semiconductor that has tremendous potential to facilitate economic growth in a semiconductor industry that is silicon-based and currently faced with diminishing returns of performance versus cost of investment. At a material level, its high electric field strength and electron mobility have already shown tremendous potential for high frequency communications and photonic applications. Advances in growth on commercially viable large area substrates are now at the point where power conversion applications of GaN are at the cusp of commercialisation. The future for building on the work described here in ways driven by specific challenges emerging from entirely new markets and applications is very exciting. This collection of GaN technology developments is therefore not itself a road map but a valuable collection of global state-of-the-art GaN research that will inform the next phase of the technology as market driven requirements evolve. First generation production devices are igniting large new markets and applications that can only be achieved using the advantages of higher speed, low specific resistivity and low saturation switching transistors. Major investments are being made by industrial companies in a wide variety of markets exploring the use of the technology in new circuit topologies, packaging solutions and system architectures that are required to achieve and optimise the system advantages offered by GaN transistors. It is this momentum that will drive priorities for the next stages of device research gathered here.en_US
dc.language.isoen_US
dc.publisherIOP Publishingen_US
dc.relation.isversionofhttps://doi.org/10.1088/1361-6463/aaaf9den_US
dc.rightsCreative Commons Attribution 3.0 Unported licenseen_US
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/en_US
dc.sourceZhang, Yuhaoen_US
dc.titleThe 2018 GaN power electronics roadmapen_US
dc.typeArticleen_US
dc.identifier.citationAmano, H et al. “The 2018 GaN Power Electronics Roadmap.” Journal of Physics D: Applied Physics 51, 16 (March 2018): 163001 © 2018 IOP Publishing Ltden_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratoriesen_US
dc.contributor.approverZhang, Yuhaoen_US
dc.contributor.mitauthorHu, Jie
dc.contributor.mitauthorPalacios, Tomas
dc.contributor.mitauthorPiedra, Daniel
dc.contributor.mitauthorSun, Min
dc.contributor.mitauthorZhang, Yuhao
dc.relation.journalJournal of Physics D: Applied Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsAmano, H; Baines, Y; Beam, E; Borga, Matteo; Bouchet, T; Chalker, Paul R; Charles, M; Chen, Kevin J; Chowdhury, Nadim; Chu, Rongming; De Santi, Carlo; De Souza, Maria Merlyne; Decoutere, Stefaan; Di Cioccio, L; Eckardt, Bernd; Egawa, Takashi; Fay, P; Freedsman, Joseph J; Guido, L; Häberlen, Oliver; Haynes, Geoff; Heckel, Thomas; Hemakumara, Dilini; Houston, Peter; Hu, Jie; Hua, Mengyuan; Huang, Qingyun; Huang, Alex; Jiang, Sheng; Kawai, H; Kinzer, Dan; Kuball, Martin; Kumar, Ashwani; Lee, Kean Boon; Li, Xu; Marcon, Denis; März, Martin; McCarthy, R; Meneghesso, Gaudenzio; Meneghini, Matteo; Morvan, E; Nakajima, A; Narayanan, E M S; Oliver, Stephen; Palacios, Tomás; Piedra, Daniel; Plissonnier, M; Reddy, R; Sun, Min; Thayne, Iain; Torres, A; Trivellin, Nicola; Unni, V; Uren, Michael J; Van Hove, Marleen; Wallis, David J; Wang, J; Xie, J; Yagi, S; Yang, Shu; Youtsey, C; Yu, Ruiyang; Zanoni, Enrico; Zeltner, Stefan; Zhang, Yuhaoen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-2190-563X
dc.identifier.orcidhttps://orcid.org/0000-0002-8104-9097
dc.identifier.orcidhttps://orcid.org/0000-0003-4858-8264
dc.identifier.orcidhttps://orcid.org/0000-0002-2849-5653
mit.licensePUBLISHER_CCen_US


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