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dc.contributor.authorZhao, Weiwei
dc.contributor.authorJiang, Jue
dc.contributor.authorWu, Lijun
dc.contributor.authorLiu, Chaoxing
dc.contributor.authorZhu, Yimei
dc.contributor.authorChan, Moses H. W.
dc.contributor.authorLi, Mingda
dc.contributor.authorChang, Cui-zu
dc.contributor.authorMoodera, Jagadeesh
dc.date.accessioned2018-10-23T12:52:36Z
dc.date.available2018-10-23T12:52:36Z
dc.date.issued2018-03
dc.date.submitted2017-07
dc.identifier.issn2375-2548
dc.identifier.urihttp://hdl.handle.net/1721.1/118750
dc.description.abstractThe exact mechanism responsible for the significant enhancement of the superconducting transition temperature (Tc) of monolayer iron selenide (FeSe) films on SrTiO₃(STO) over that of bulk FeSe is an open issue. We present the results of a coordinated study of electrical transport, low temperature electron energy-loss spectroscopy (EELS), and high-Angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) measurements on FeSe/STO films of different thicknesses. HAADF-STEM imaging together with EELS mapping across the FeSe/STO interface shows direct evidence of electrons transferred from STO to the FeSe layer. The transferred electrons were found to accumulate within the first two atomic layers of the FeSe films near the STO substrate. An additional Se layer is also resolved to reside between the FeSe film and the TiOx-terminated STO substrate. Our transport results found that a positive backgate applied from STO is particularly effective in enhancing Tcof the films while minimally changing the carrier density. This increase in Tcis due to the positive backgate that "pulls" the transferred electrons in FeSe films closer to the interface and thus enhances their coupling to interfacial phonons and also the electron-electron interaction within FeSe films.en_US
dc.publisherAmerican Association for the Advancement of Science (AAAS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1126/SCIADV.AAO2682en_US
dc.rightsCreative Commons Attribution-NonCommercial 4.0 Internationalen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc/4.0/en_US
dc.sourceScience Advancesen_US
dc.titleDirect imaging of electron transfer and its influence on superconducting pairing at FeSe/SrTiOen_US
dc.typeArticleen_US
dc.identifier.citationZhao, Weiwei, Mingda Li, Cui-Zu Chang, Jue Jiang, Lijun Wu, Chaoxing Liu, Jagadeesh S. Moodera, Yimei Zhu, and Moses H. W. Chan. “Direct Imaging of Electron Transfer and Its Influence on Superconducting Pairing at FeSe/SrTiO3interface.” Science Advances 4, no. 3 (March 2018): eaao2682.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Plasma Science and Fusion Centeren_US
dc.contributor.departmentMIT Energy Initiativeen_US
dc.contributor.departmentFrancis Bitter Magnet Laboratory (Massachusetts Institute of Technology)en_US
dc.contributor.mitauthorLi, Mingda
dc.contributor.mitauthorChang, Cui-zu
dc.contributor.mitauthorMoodera, Jagadeesh
dc.relation.journalScience Advancesen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2018-10-15T16:12:45Z
dspace.orderedauthorsZhao, Weiwei; Li, Mingda; Chang, Cui-Zu; Jiang, Jue; Wu, Lijun; Liu, Chaoxing; Moodera, Jagadeesh S.; Zhu, Yimei; Chan, Moses H. W.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-7055-6368
dc.identifier.orcidhttps://orcid.org/0000-0001-7413-5715
dc.identifier.orcidhttps://orcid.org/0000-0002-2480-1211
mit.licensePUBLISHER_CCen_US


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