dc.contributor.author | Dominguez, Sagrario | |
dc.contributor.author | Cornago, Ignacio | |
dc.contributor.author | Bravo, Javier | |
dc.contributor.author | Pérez-Conde, Jesus | |
dc.contributor.author | Choi, Hyungryul J. | |
dc.contributor.author | Kim, Jeong-Gil | |
dc.contributor.author | Barbastathis, George | |
dc.date.accessioned | 2018-11-14T19:46:55Z | |
dc.date.available | 2018-11-14T19:46:55Z | |
dc.date.issued | 2014-03 | |
dc.identifier.issn | 2166-2746 | |
dc.identifier.issn | 2166-2754 | |
dc.identifier.uri | http://hdl.handle.net/1721.1/119017 | |
dc.description.abstract | In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000 nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance performance that the authors achieved have never been reported before for ordered tapered nanostructures, to our knowledge. © 2014 American Vacuum Society. | en_US |
dc.publisher | American Vacuum Society | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1116/1.4869302 | en_US |
dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
dc.source | Other repository | en_US |
dc.title | Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Dominguez, Sagrario, et al. “Simple Fabrication of Ultrahigh Aspect Ratio Nanostructures for Enhanced Antireflectivity.” Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, vol. 32, no. 3, May 2014, p. 030602. © 2014 American Vacuum Society | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | en_US |
dc.contributor.mitauthor | Dominguez, Sagrario | |
dc.contributor.mitauthor | Barbastathis, George | |
dc.relation.journal | Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena | en_US |
dc.eprint.version | Final published version | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
dc.date.updated | 2018-10-29T15:56:26Z | |
dspace.orderedauthors | Dominguez, Sagrario; Cornago, Ignacio; Bravo, Javier; Pérez-Conde, Jesus; Choi, Hyungryul J.; Kim, Jeong-Gil; Barbastathis, George | en_US |
dspace.embargo.terms | N | en_US |
dc.identifier.orcid | https://orcid.org/0000-0002-4140-1404 | |
mit.license | PUBLISHER_POLICY | en_US |