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dc.contributor.authorYin, Kedi
dc.contributor.authorLing, Xi
dc.contributor.authorXue, Jianmin
dc.contributor.authorChen, Yan
dc.contributor.authorHuang, Shengxi
dc.contributor.authorJi, Xiang
dc.contributor.authorAdepalli, Kiran Kumar
dc.contributor.authorWang, Xinwei
dc.contributor.authorDresselhaus, Mildred
dc.contributor.authorKong, Jing
dc.contributor.authorYildiz, Bilge
dc.date.accessioned2019-02-11T16:08:44Z
dc.date.available2019-02-11T16:08:44Z
dc.date.issued2018-02
dc.date.submitted2017-11
dc.identifier.issn1936-0851
dc.identifier.issn1936-086X
dc.identifier.urihttp://hdl.handle.net/1721.1/120317
dc.description.abstractTransition-metal dichalcogenides (TMDs) have emerged in recent years as a special group of two-dimensional materials and have attracted tremendous attention. Among these TMD materials, molybdenum disulfide (MoS₂) has shown promising applications in electronics, photonics, energy, and electrochemistry. In particular, the defects in MoS₂ play an essential role in altering the electronic, magnetic, optical, and catalytic properties of MoS₂, presenting a useful way to engineer the performance of MoS₂. The mechanisms by which lattice defects affect the MoS₂ properties are unsettled. In this work, we reveal systematically how lattice defects and substrate interface affect MoS₂ electronic structure. We fabricated single-layer MoS₂ by chemical vapor deposition and then transferred onto Au, single-layer graphene, hexagonal boron nitride, and CeO₂ as substrates and created defects in MoS₂ by ion irradiation. We assessed how these defects and substrates affect the electronic structure of MoS₂ by performing X-ray photoelectron spectroscopy, Raman and photoluminescence spectroscopies, and scanning tunneling microscopy/spectroscopy measurements. Molecular dynamics and first-principles based simulations allowed us to conclude the predominant lattice defects upon ion irradiation and associate those with the experimentally obtained electronic structure. We found that the substrates can tune the electronic energy levels in MoS₂ due to charge transfer at the interface. Furthermore, the reduction state of CeO₂ as an oxide substrate affects the interface charge transfer with MoS₂. The irradiated MoS2 had a faster hydrogen evolution kinetics compared to the as-prepared MoS2, demonstrating the concept of defect controlled reactivity in this phase. Our findings provide effective probes for energy band and defects in MoS₂ and show the importance of defect engineering in tuning the functionalities of MoS₂ and other TMDs in electronics, optoelectronics, and electrochemistry. Keywords: hydrogen evolution reaction; ion irradiation; Raman spectroscopy; scanning tunneling microscopy; transition-metal dichalcogenides; X-ray photoelectron spectroscopyen_US
dc.description.sponsorshipUnited States. Department of Energy. Office of Basic Energy Sciences (Award DE-SC0001088)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Award 0939514)en_US
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/ACSNANO.7B08418en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOther repositoryen_US
dc.titleTuning Electronic Structure of Single Layer MoS₂ through Defect and Interface Engineeringen_US
dc.typeArticleen_US
dc.identifier.citationChen, Yan et al. “Tuning Electronic Structure of Single Layer MoS₂ through Defect and Interface Engineering.” ACS Nano 12, 3 (February 2018): 2569–2579 © 2018 American Chemical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Computer Science and Artificial Intelligence Laboratoryen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.mitauthorChen, Yan
dc.contributor.mitauthorHuang, Shengxi
dc.contributor.mitauthorJi, Xiang
dc.contributor.mitauthorAdepalli, Kiran Kumar
dc.contributor.mitauthorLing, Xi
dc.contributor.mitauthorWang, Xinwei
dc.contributor.mitauthorDresselhaus, Mildred
dc.contributor.mitauthorKong, Jing
dc.contributor.mitauthorYildiz, Bilge
dc.relation.journalACS Nanoen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2019-02-01T13:18:58Z
dspace.orderedauthorsChen, Yan; Huang, Shengxi; Ji, Xiang; Adepalli, Kiran; Yin, Kedi; Ling, Xi; Wang, Xinwei; Xue, Jianmin; Dresselhaus, Mildred; Kong, Jing; Yildiz, Bilgeen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-6063-023X
dc.identifier.orcidhttps://orcid.org/0000-0002-3618-9074
dc.identifier.orcidhttps://orcid.org/0000-0001-6305-1161
dc.identifier.orcidhttps://orcid.org/0000-0001-9641-1901
dc.identifier.orcidhttps://orcid.org/0000-0002-1955-3081
dc.identifier.orcidhttps://orcid.org/0000-0001-8492-2261
dc.identifier.orcidhttps://orcid.org/0000-0003-0551-1208
dc.identifier.orcidhttps://orcid.org/0000-0002-2688-5666
mit.licensePUBLISHER_POLICYen_US


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