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dc.contributor.authorAdera, Solomon
dc.contributor.authorRaj, Rishi
dc.contributor.authorWang, Evelyn
dc.date.accessioned2019-02-21T15:01:58Z
dc.date.available2019-02-21T15:01:58Z
dc.date.issued2013-12
dc.identifier.isbn978-0-7918-5615-4
dc.identifier.urihttp://hdl.handle.net/1721.1/120516
dc.description.abstractThermal management is increasingly becoming a bottleneck for a variety of high power density applications such as integrated circuits, solar cells, microprocessors, and energy conversion devices. The performance and reliability of these devices are usually limited by the rate at which heat can be removed from the device footprint, which averages well above 100 W/cm[superscript 2] (locally this heat flux can exceed 1000 W/cm[superscript 2]). State-of-the-art air cooling strategies which utilize the sensible heat are insufficient at these large heat fluxes. As a result, novel thermal management solutions such as via thin-film evaporation that utilize the latent heat of vaporization of a fluid are needed. The high latent heat of vaporization associated with typical liquidvapor phase change phenomena allows significant heat transfer with small temperature rise. In this work, we demonstrate a promising thermal management approach where square arrays of cylindrical micropillar arrays are used for thin-film evaporation. The microstructures control the liquid film thickness and the associated thermal resistance in addition to maintaining a continuous liquid supply via the capillary pumping mechanism. When the capillary-induced liquid supply mechanism cannot deliver sufficient liquid for phase change heat transfer, the critical heat flux is reached and dryout occurs. This capillary limitation on thin-film evaporation was experimentally investigated by fabricating well-defined silicon micropillar arrays using standard contact photolithography and deep reactive ion etching. A thin film resistive heater and thermal sensors were integrated on the back side of the test sample using e-beam evaporation and acetone lift-off. The experiments were carried out in a controlled environmental chamber maintained at the water saturation pressure of ≈3.5 kPa and ≈25 °C. We demonstrated significantly higher heat dissipation capability in excess of 100 W/cm[superscript 2]. These preliminary results suggest the potential of thin-film evaporation from microstructured surfaces for advanced thermal management applications.en_US
dc.description.sponsorshipUnited States. Office of Naval Researchen_US
dc.description.sponsorshipNational Science Foundation (U.S.). Graduate Research Fellowship Programen_US
dc.description.sponsorshipBattelleen_US
dc.publisherAmerican Society of Mechanical Engineersen_US
dc.relation.isversionofhttp://dx.doi.org/10.1115/MNHMT2013-22120en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceASMEen_US
dc.titleCapillary-Limited Evaporation From Well-Defined Microstructured Surfacesen_US
dc.typeArticleen_US
dc.identifier.citationAdera, Solomon, Rishi Raj, and Evelyn N. Wang. “Capillary-Limited Evaporation From Well-Defined Microstructured Surfaces.” ASME 2013 4th International Conference on Micro/Nanoscale Heat and Mass Transfer, 11-14 December, 2014, Hong Kong, China, ASME, 2014. © 2013 by ASMEen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorAdera, Solomon
dc.contributor.mitauthorRaj, Rishi
dc.contributor.mitauthorWang, Evelyn
dc.relation.journalASME 2013 4th International Conference on Micro/Nanoscale Heat and Mass Transferen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2019-01-09T18:05:21Z
dspace.orderedauthorsAdera, Solomon; Raj, Rishi; Wang, Evelyn N.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-0258-0745
dc.identifier.orcidhttps://orcid.org/0000-0001-7045-1200
mit.licensePUBLISHER_POLICYen_US


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