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Inverse Designed Metalenses with Extended Depth of Focus

Author(s)
Bayati, Elyas; Pestourie, Raphaël; Colburn, Shane; Lin, Zin; Johnson, Steven G.; Majumdar, Arka; ... Show more Show less
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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Abstract
Extended depth of focus (EDOF) lenses are important for various applications in computational imaging and microscopy. In addition to enabling novel functionalities, EDOF lenses can alleviate the need for stringent alignment requirements for imaging systems. Existing designs, however, are often inefficient or produce an asymmetric point spread function (PSF) that blurs images. Inverse design of nanophotonics, including metasurfaces, has generated strong interest in recent years owing to its potential for generating exotic and innovative optical elements, which are generally difficult to design based on intuition alone. Using adjoint optimization-based inverse electromagnetic design, in this paper, we designed a cylindrical metasurface lens operating at ∼625 nm with a depth of focus exceeding that of an ordinary lens. We validated our design by nanofabrication and optical characterization of silicon nitride metasurface lenses (with a lateral dimension of 66.66 μm) with three different focal lengths (66.66, 100, and 133.33 μm). The focusing efficiencies of the fabricated extended depth of focus metasurface lenses are similar to those of traditional metalenses. Keywords: diffractive optics; dielectric metasurface; extended depth of focus lens; inverse design; cylindrical lens
Date issued
2020-03
URI
https://hdl.handle.net/1721.1/124931
Department
Massachusetts Institute of Technology. Department of Mathematics
Journal
ACS Photonics
Publisher
American Chemical Society (ACS)
Citation
Bayati, Elyas et al. "Inverse Designed Metalenses with Extended Depth of Focus." ACS Photonics 7, 4 (March 2020): 873-878 © 2020 American Chemical Society.
Version: Author's final manuscript
ISSN
2330-4022

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