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dc.contributor.authorWest, Gavin Neal
dc.contributor.authorLoh, William
dc.contributor.authorKharas, Dave
dc.contributor.authorSorace-Agaskar, Cheryl
dc.contributor.authorMehta, Karan Kartik
dc.contributor.authorSage, Jeremy M.
dc.contributor.authorChiaverini, John
dc.contributor.authorRam, Rajeev J
dc.date.accessioned2020-04-30T17:10:07Z
dc.date.available2020-04-30T17:10:07Z
dc.date.issued2019-02
dc.date.submitted2018-08
dc.identifier.issn2378-0967
dc.identifier.urihttps://hdl.handle.net/1721.1/124942
dc.description.abstractWe present a low-loss integrated photonics platform in the visible and near ultraviolet (UV) regime. Fully etched waveguides based on atomic layer deposition (ALD) of aluminum oxide operate in a single transverse mode with <3 dB/cm propagation loss at a wavelength of 371 nm. Ring resonators with intrinsic quality factors exceeding 470 000 are demonstrated at 405 nm, and the thermo-optic coefficient of ALD aluminum oxide is estimated to be 2.75 × 10[superscript −5] (RIU/°C). Absorption loss is sufficiently low to allow on-resonance operation with intra-cavity powers up to at least 12.5 mW, limited by available laser power. Experimental and simulated data indicate that the propagation loss is dominated by sidewall roughness, suggesting that lower loss in the blue and UV is achievable.en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (ECCS-1408495)en_US
dc.description.sponsorshipOffice of the Assistant Secretary of Defense for Research and Engineering (United States. Air Force. Contract A8721-05-C-0002)en_US
dc.language.isoen
dc.publisherAIP Publishingen_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.5052502en_US
dc.rightsCreative Commons Attribution 4.0 International licenseen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceAmerican Institute of Physics (AIP)en_US
dc.titleLow-loss integrated photonics for the blue and ultraviolet regimeen_US
dc.typeArticleen_US
dc.identifier.citationWest, Gavin N., et al. “Low-Loss Integrated Photonics for the Blue and Ultraviolet Regime.” APL Photonics 4, 2 (February 2019): 026101. © 2019 the Authorsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentLincoln Laboratoryen_US
dc.relation.journalAPL Photonicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2019-07-02T15:26:41Z
dspace.date.submission2019-07-02T15:26:42Z
mit.journal.volume4en_US
mit.journal.issue2en_US
mit.metadata.statusComplete


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