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dc.contributor.authorJaramillo, R.
dc.contributor.authorJaramillo, Rafael
dc.date.accessioned2020-07-16T15:56:22Z
dc.date.available2020-07-16T15:56:22Z
dc.date.issued2019-10
dc.date.submitted2019-08
dc.identifier.issn2166-532X
dc.identifier.urihttps://hdl.handle.net/1721.1/126223
dc.description.abstractThe dielectric response of materials underpins electronics and photonics. At high frequencies, dielectric polarizability sets the scale for optical density and absorption. At low frequencies, dielectric polarizability determines the band diagram of junctions and devices, and nonlinear effects enable tunable capacitors and electro-optic modulators. More complicated but no less important is the role of dielectric response in screening bound and mobile charges. These effects control defect charge capture and recombination rates, set the scale for insulator-metal transitions, and mediate interactions among charge carriers and between charge carriers and phonons. In this perspective, we motivate the discovery of highly polarizable semiconductors by highlighting their potential to improve existing and enable new optoelectronic device technologies. We then suggest discovery strategies based on solid state chemical principles and building on recent efforts in computational materials screening.en_US
dc.description.sponsorshipAir Force Office of Scientific Research (Grant FA9550-16-1-0335)en_US
dc.description.sponsorshipArmy Research Office (Grant W911NF-19-1-0137)en_US
dc.publisherAIP Publishingen_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.5124795en_US
dc.rightsCreative Commons Attribution 4.0 International licenseen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceProf. Jaramilloen_US
dc.titleIn praise and in search of highly-polarizable semiconductors: Technological promise and discovery strategiesen_US
dc.typeArticleen_US
dc.identifier.citationJaramillo, R. and J. Ravichandran. "In praise and in search of highly-polarizable semiconductors: Technological promise and discovery strategies." APL Materials 7, 10 (October 2019): 100902 © 2019 Author(s)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.approverJaramillo, Rafaelen_US
dc.relation.journalAPL Materialsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.date.submission2020-07-11T11:51:09Z
mit.journal.volume7en_US
mit.journal.issue10en_US
mit.licensePUBLISHER_CC
mit.metadata.statusComplete


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