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dc.contributor.authorKärtner, Franz X.
dc.contributor.authorCallahan, Patrick T.
dc.contributor.authorShtyrkova, Katia
dc.contributor.authorLi, Nanxi
dc.contributor.authorSingh, Neetesh Kumar
dc.contributor.authorXin, Ming
dc.contributor.authorRavi, Koustuban
dc.contributor.authorNotaros, Jelena
dc.contributor.authorMagden, Emir Salih
dc.contributor.authorVermeulen, Diedrik Rene Georgette
dc.contributor.authorIppen, Erich Peter
dc.contributor.authorWatts, Michael
dc.date.accessioned2021-02-08T21:09:06Z
dc.date.available2021-02-08T21:09:06Z
dc.date.issued2018-05
dc.date.submitted2018-04
dc.identifier.isbn9781510618985
dc.identifier.isbn9781510618992
dc.identifier.urihttps://hdl.handle.net/1721.1/129712
dc.description.abstractMode-locked lasers provide extremely low jitter optical pulse trains for a number of applications ranging from sampling of RF-signals and optical frequency combs to microwave and optical signal synthesis. Integrated versions have the advantage of high reliability, low cost and compact. Here, we describe a fully integrated mode-locked laser architecture on a CMOS platform that utilizes rare-earth doped gain media, double-chirped waveguide gratings for dispersion compensation and nonlinear Michelson Interferometers for generating an artificial saturable absorber to implement additive pulse mode locking on chip. First results of devices at 1.9 μm using thulium doped aluminum-oxide glass and operating in the Q-switched mode locking regime are presented.en_US
dc.language.isoen
dc.publisherSociety of Photo-Optical Instrumentation Engineers (SPIE)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1117/12.2318010en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleIntegrated rare-Earth doped mode-locked lasers on a CMOS platformen_US
dc.typeArticleen_US
dc.identifier.citationKärtner, Franz X. et al. "Integrated rare-Earth doped mode-locked lasers on a CMOS platform." Silicon Photonics: From Fundamental Research to Manufacturing, April 2018, Strasbourg, France, Society of Photo-Optical Instrumentation Engineers, May 2018. © 2018 SPIEen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.departmentLincoln Laboratoryen_US
dc.relation.journalSilicon Photonics: From Fundamental Research to Manufacturingen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dc.date.updated2019-07-16T14:18:57Z
dspace.date.submission2019-07-16T14:18:58Z
mit.metadata.statusComplete


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