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dc.contributor.authorRollo, T.
dc.contributor.authorDaniel, Luca
dc.contributor.authorEsseni, D.
dc.date.accessioned2021-06-15T20:02:16Z
dc.date.available2021-06-15T20:02:16Z
dc.date.issued2019-10
dc.date.submitted2019-09
dc.identifier.isbn9781728109404
dc.identifier.issn1946-1577
dc.identifier.urihttps://hdl.handle.net/1721.1/130948
dc.description.abstractIn recent years electron devices based on ferroelectric materials have attracted a lot of interest well beyond FeRAM memories. Negative capacitance transistors (NC-FETs) have been investigated as steep slope transistors [1], [2], and Ferroelectric FETs (Fe-FETs) are under intense scrutiny also as synaptic devices for neuromorphc computing, where the minor loops in ferroelectrics can allow to achieve multiple values of conductance in read mode [3], [4], [5]. Furthermore, the persistence of ferroelectricity in ultra-thin ferroelectric layers paved the way to ferroelectric tunnelling junctions [6], where a polarization dependent tunneling current can be exploited to realize high impedance memristors, amenable for ultra power-efficient and thus massive parallel computation.en_US
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1109/sispad.2019.8870373en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceLuca Danielen_US
dc.titleAccurate and Efficient Dynamic Simulations of Ferroelectric Based Electron Devicesen_US
dc.typeArticleen_US
dc.identifier.citationRollo, T. et al. "Accurate and Efficient Dynamic Simulations of Ferroelectric Based Electron Devices." 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), September 2019, Udine, Italy, October 2019. © 2019 IEEEen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.approverDaniel, Lucaen_US
dc.relation.journal2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)en_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dspace.date.submission2021-06-10T20:51:54Z
mit.licenseOPEN_ACCESS_POLICY
mit.metadata.statusComplete


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