dc.contributor.author | Rollo, T. | |
dc.contributor.author | Daniel, Luca | |
dc.contributor.author | Esseni, D. | |
dc.date.accessioned | 2021-06-15T20:02:16Z | |
dc.date.available | 2021-06-15T20:02:16Z | |
dc.date.issued | 2019-10 | |
dc.date.submitted | 2019-09 | |
dc.identifier.isbn | 9781728109404 | |
dc.identifier.issn | 1946-1577 | |
dc.identifier.uri | https://hdl.handle.net/1721.1/130948 | |
dc.description.abstract | In recent years electron devices based on ferroelectric materials have attracted a lot of interest well beyond FeRAM memories. Negative capacitance transistors (NC-FETs) have been investigated as steep slope transistors [1], [2], and Ferroelectric FETs (Fe-FETs) are under intense scrutiny also as synaptic devices for neuromorphc computing, where the minor loops in ferroelectrics can allow to achieve multiple values of conductance in read mode [3], [4], [5]. Furthermore, the persistence of ferroelectricity in ultra-thin ferroelectric layers paved the way to ferroelectric tunnelling junctions [6], where a polarization dependent tunneling current can be exploited to realize high impedance memristors, amenable for ultra power-efficient and thus massive parallel computation. | en_US |
dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1109/sispad.2019.8870373 | en_US |
dc.rights | Creative Commons Attribution-Noncommercial-Share Alike | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-sa/4.0/ | en_US |
dc.source | Luca Daniel | en_US |
dc.title | Accurate and Efficient Dynamic Simulations of Ferroelectric Based Electron Devices | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Rollo, T. et al. "Accurate and Efficient Dynamic Simulations of Ferroelectric Based Electron Devices." 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), September 2019, Udine, Italy, October 2019. © 2019 IEEE | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
dc.contributor.approver | Daniel, Luca | en_US |
dc.relation.journal | 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) | en_US |
dc.eprint.version | Author's final manuscript | en_US |
dc.type.uri | http://purl.org/eprint/type/ConferencePaper | en_US |
eprint.status | http://purl.org/eprint/status/NonPeerReviewed | en_US |
dspace.date.submission | 2021-06-10T20:51:54Z | |
mit.license | OPEN_ACCESS_POLICY | |
mit.metadata.status | Complete | |