Photonic topology optimization with semiconductor-foundry design-rule constraints
Author(s)
Hammond, Alec; Oskooi, Ardavan; Johnson, Steven G; Ralph, Stephen
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We present a unified density-based topology-optimization framework that yields integrated photonic designs optimized for manufacturing constraints including all those of commercial semiconductor foundries. We introduce a new method to impose minimum-area and minimum-enclosed-area constraints, and simultaneously adapt previous techniques for minimum linewidth, linespacing, and curvature, all of which are implemented without any additional re-parameterizations. Furthermore, we show how differentiable morphological transforms can be used to produce devices that are robust to over/under-etching while also satisfying manufacturing constraints. We demonstrate our methodology by designing three broadband silicon-photonics devices for nine different foundry-constraint combinations.
Date issued
2021-06Department
Massachusetts Institute of Technology. Department of MathematicsJournal
Optics Express
Publisher
The Optical Society
Citation
Hammond, Alec et al. "Photonic topology optimization with semiconductor-foundry design-rule constraints." Optics Express 29, 15 (June 2021): 23916-23938. © 2021 Optical Society of America
Version: Final published version
ISSN
1094-4087