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dc.contributor.authorIsmail, Fawad
dc.contributor.authorSarker, Palash
dc.contributor.authorMohamed, Mohamed
dc.contributor.authorKim, Kyekyoon
dc.contributor.authorRavaioli, Umberto
dc.date.accessioned2021-09-20T17:30:46Z
dc.date.available2021-09-20T17:30:46Z
dc.date.issued2018-07-24
dc.identifier.urihttps://hdl.handle.net/1721.1/131880
dc.description.abstractAbstract In this paper, we describe the development of moving mesh adaptation framework and its application to charge transport simulation of semiconductor devices, with emphasis on its relevance to power semiconductor devices. Mesh adaptivity in the context of semiconductor device simulation is an important problem and can help deal with the convergence and numerical stability issues, as well as automate the meshing process. We demonstrate the efficacy of our proposed meshing scheme through the simulation of a GaN-based power diode, as well as a Si diode with a non-rectangular doping profile, by externally coupling our framework to Sentaurus Device TCAD. We perform error analysis and compare our results with simulations based on high-resolution uniform structured meshes as well as manually refined axis-aligned meshes. In addition to the benefits in terms of accuracy, automation, and generality, our method can be regarded as a stepping stone toward computationally scalable and adaptive semiconductor device simulations.en_US
dc.publisherSpringer USen_US
dc.relation.isversionofhttps://doi.org/10.1007/s10825-018-1218-5en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSpringer USen_US
dc.titleMoving mesh adaptation for Si and GaN-based power device simulationen_US
dc.typeArticleen_US
dc.contributor.departmentMassachusetts Institute of Technology. Plasma Science and Fusion Center
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2020-09-24T21:38:28Z
dc.language.rfc3066en
dc.rights.holderSpringer Science+Business Media, LLC, part of Springer Nature
dspace.embargo.termsY
dspace.date.submission2020-09-24T21:38:28Z
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work and Publication Information Needed


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