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dc.contributor.authorZhang, Zhengxing
dc.contributor.authorMcIlrath, Michael B
dc.contributor.authorBoning, Duane S
dc.date.accessioned2021-09-20T18:21:29Z
dc.date.available2021-09-20T18:21:29Z
dc.identifier.urihttps://hdl.handle.net/1721.1/132250
dc.description.abstract© COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only. Integrated silicon photonics offers great potential for monolithic integrated photonic and electronic components using existing integrated circuit fabrication infrastructure. However, understanding of the impact of IC process variations on performance of photonic components remains limited. Methods for analysis that identify sensitivity of photonic components to the variety of process variations encountered during fabrication are crucial to enable viable design and manufacturing of silicon photonic systems. We present the application of the adjoint method to predict the impact of different types of particle defects on silicon photonic circuits. The adjoint method is applied for both component and circuit level analysis to reduce computational cost, and shows good consistency with direct simulations. The results for complicated device components and small circuits are shown and discussed. The model and results can be used to help generate layout design rules and critical area extraction methods, and to assist silicon photonics designers in predicting and optimizing yield of complex silicon photonics devices and circuits.en_US
dc.language.isoen
dc.publisherSPIE-Intl Soc Optical Engen_US
dc.relation.isversionof10.1117/12.2528978en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleAdjoint-based particle defect yield modeling for silicon photonicsen_US
dc.typeArticleen_US
dc.relation.journalProceedings of SPIE - The International Society for Optical Engineeringen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dc.date.updated2020-12-03T15:14:30Z
dspace.orderedauthorsZhang, Z; McIlrath, MB; Boning, DSen_US
dspace.date.submission2020-12-03T15:14:32Z
mit.journal.volume11103en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work and Publication Information Needed


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