Show simple item record

dc.contributor.authorMonmeyran, Corentin
dc.contributor.authorCrowe, Iain F
dc.contributor.authorGwilliam, Russell M
dc.contributor.authorHeidelberger, Christopher
dc.contributor.authorNapolitani, Enrico
dc.contributor.authorPastor, David
dc.contributor.authorGandhi, Hemi H
dc.contributor.authorMazur, Eric
dc.contributor.authorMichel, Jürgen
dc.contributor.authorAgarwal, Anuradha M
dc.contributor.authorKimerling, Lionel C
dc.date.accessioned2021-10-27T20:08:41Z
dc.date.available2021-10-27T20:08:41Z
dc.date.issued2018
dc.identifier.urihttps://hdl.handle.net/1721.1/134690
dc.description.abstract© 2017 Author(s). Co-doping with fluorine is a potentially promising method for defect passivation to increase the donor electrical activation in highly doped n-type germanium. However, regular high dose donor-fluorine co-implants, followed by conventional thermal treatment of the germanium, typically result in a dramatic loss of the fluorine, as a result of the extremely large diffusivity at elevated temperatures, partly mediated by the solid phase epitaxial regrowth. To circumvent this problem, we propose and experimentally demonstrate two non-amorphizing co-implantation methods; one involving consecutive, low dose fluorine implants, intertwined with rapid thermal annealing and the second, involving heating of the target wafer during implantation. Our study confirms that the fluorine solubility in germanium is defect-mediated and we reveal the extent to which both of these strategies can be effective in retaining large fractions of both the implanted fluorine and, critically, phosphorus donors.
dc.language.isoen
dc.publisherAIP Publishing
dc.relation.isversionof10.1063/1.4999210
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
dc.sourceOther repository
dc.titleImproved retention of phosphorus donors in germanium using a non-amorphizing fluorine co-implantation technique
dc.typeArticle
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.contributor.departmentMassachusetts Institute of Technology. Microphotonics Center
dc.relation.journalJournal of Applied Physics
dc.eprint.versionFinal published version
dc.type.urihttp://purl.org/eprint/type/JournalArticle
eprint.statushttp://purl.org/eprint/status/PeerReviewed
dc.date.updated2019-09-20T18:26:08Z
dspace.orderedauthorsMonmeyran, C; Crowe, IF; Gwilliam, RM; Heidelberger, C; Napolitani, E; Pastor, D; Gandhi, HH; Mazur, E; Michel, J; Agarwal, AM; Kimerling, LC
dspace.date.submission2019-09-20T18:26:10Z
mit.journal.volume123
mit.journal.issue16
mit.metadata.statusAuthority Work and Publication Information Needed


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record