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dc.contributor.authorAlbo, Asaf
dc.contributor.authorFlores, Yuri V
dc.contributor.authorHu, Qing
dc.contributor.authorReno, John L
dc.date.accessioned2021-10-27T20:09:27Z
dc.date.available2021-10-27T20:09:27Z
dc.date.issued2017
dc.identifier.urihttps://hdl.handle.net/1721.1/134844
dc.description.abstract© 2017 Author(s). The mechanisms that limit the temperature performance of diagonal GaAs/Al0.15GaAs0.85-based terahertz quantum cascade lasers (THz-QCLs) have been identified as thermally activated leakage of charge carriers through excited states into the continuum. THz-QCLs with energetically higher-laying excited states supported by sufficiently high barriers aim to eliminate these leakage mechanisms and lead to improved temperature performance. Although suppression of thermally activated carrier leakage was realized in a three-well THz-QCL based on a resonant-phonon scheme, no improvement in the temperature performance was reported thus far. Here, we report a major improvement in the temperature performance of a two-quantum-well direct-phonon THz-QCL structure. We show that the improved laser performance is due to the suppression of the thermally activated carrier leakage into the continuum with the increase in the injection barrier height. Moreover, we demonstrate that high-barrier two-well structures can support a clean three-level laser system at elevated temperatures, which opens the opportunity to achieve temperature performance beyond the state-of-the-art.
dc.language.isoen
dc.publisherAIP Publishing
dc.relation.isversionof10.1063/1.4996567
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
dc.sourceOther repository
dc.titleTwo-well terahertz quantum cascade lasers with suppressed carrier leakage
dc.typeArticle
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronics
dc.relation.journalApplied Physics Letters
dc.eprint.versionFinal published version
dc.type.urihttp://purl.org/eprint/type/JournalArticle
eprint.statushttp://purl.org/eprint/status/PeerReviewed
dc.date.updated2019-06-05T18:17:23Z
dspace.orderedauthorsAlbo, A; Flores, YV; Hu, Q; Reno, JL
dspace.date.submission2019-06-05T18:17:24Z
mit.journal.volume111
mit.journal.issue11
mit.metadata.statusAuthority Work and Publication Information Needed


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