dc.contributor.author | Krieg, Linus | |
dc.contributor.author | Zhang, Zhipeng | |
dc.contributor.author | Splith, Daniel | |
dc.contributor.author | von Wenckstern, Holger | |
dc.contributor.author | Grundmann, Marius | |
dc.contributor.author | Wang, Xiaoxue | |
dc.contributor.author | Gleason, Karen K | |
dc.contributor.author | Voss, Tobias | |
dc.date.accessioned | 2022-06-07T12:56:13Z | |
dc.date.available | 2021-10-27T20:23:14Z | |
dc.date.available | 2022-06-07T12:56:13Z | |
dc.date.issued | 2020-04 | |
dc.date.submitted | 2020-03 | |
dc.identifier.issn | 2632-959X | |
dc.identifier.uri | https://hdl.handle.net/1721.1/135386.2 | |
dc.language.iso | en | |
dc.publisher | IOP Publishing | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1088/2632-959x/ab82e6 | en_US |
dc.rights | Creative Commons Attribution 4.0 International license | en_US |
dc.rights.uri | https://creativecommons.org/licenses/by/4.0/ | en_US |
dc.source | IOP Publishing | en_US |
dc.title | Controlled formation of Schottky diodes on n-doped ZnO layers by deposition of p-conductive polymer layers with oxidative chemical vapor deposition | en_US |
dc.type | Article | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Chemical Engineering | |
dc.relation.journal | Nano Express | en_US |
dc.eprint.version | Final published version | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
dc.date.updated | 2021-06-16T18:46:46Z | |
dspace.orderedauthors | Krieg, L; Zhang, Z; Splith, D; von Wenckstern, H; Grundmann, M; Wang, X; Gleason, KK; Voss, T | en_US |
dspace.date.submission | 2021-06-16T18:46:47Z | |
mit.journal.volume | 1 | en_US |
mit.journal.issue | 1 | en_US |
mit.license | PUBLISHER_CC | |
mit.metadata.status | Authority Work Needed | en_US |