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dc.contributor.authorSun, Weike
dc.contributor.authorPaiva, Antonio RC
dc.contributor.authorXu, Peng
dc.contributor.authorSundaram, Anantha
dc.contributor.authorBraatz, Richard D
dc.date.accessioned2021-10-27T20:23:44Z
dc.date.available2021-10-27T20:23:44Z
dc.date.issued2020
dc.identifier.urihttps://hdl.handle.net/1721.1/135497
dc.description.abstract© 2020 In the processing and manufacturing industries, there has been a large push to produce higher quality products and ensure maximum efficiency of processes, which requires approaches to effectively detect and resolve disturbances to ensure optimal operations. While many types of disturbances can be compensated by a control system, it cannot handle some large process disruptions. As such, it is important to develop monitoring systems to effectively detect and identify those faults such that they can be quickly resolved by operators. This article proposes a novel probabilistic fault detection and identification method which adopts a newly developed deep learning approach using Bayesian recurrent neural networks (BRNNs) with variational dropout. The BRNN model is general and can model complex nonlinear dynamics. Moreover, compared to traditional statistic-based data-driven fault detection and identification methods, the proposed BRNN-based method yields uncertainty estimates which allow for simultaneous fault detection of chemical processes, direct fault identification, and fault propagation analysis. The performance of the method is demonstrated and contrasted to (dynamic) principal component analysis, which is widely applied in the industry, in the benchmark Tennessee Eastman process (TEP) and a real chemical manufacturing dataset.
dc.language.isoen
dc.publisherElsevier BV
dc.relation.isversionof10.1016/J.COMPCHEMENG.2020.106991
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivs License
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/
dc.sourcearXiv
dc.titleFault detection and identification using Bayesian recurrent neural networks
dc.typeArticle
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.relation.journalComputers and Chemical Engineering
dc.eprint.versionAuthor's final manuscript
dc.type.urihttp://purl.org/eprint/type/JournalArticle
eprint.statushttp://purl.org/eprint/status/PeerReviewed
dc.date.updated2021-06-09T12:33:04Z
dspace.orderedauthorsSun, W; Paiva, ARC; Xu, P; Sundaram, A; Braatz, RD
dspace.date.submission2021-06-09T12:33:06Z
mit.journal.volume141
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Needed


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