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dc.contributor.authorPurnawirman
dc.contributor.authorLi, Nanxi
dc.contributor.authorMagden, Emir Salih
dc.contributor.authorSingh, Gurpreet
dc.contributor.authorSingh, Neetesh
dc.contributor.authorBaldycheva, Anna
dc.contributor.authorHosseini, Ehsan Shah
dc.contributor.authorSun, Jie
dc.contributor.authorMoresco, Michele
dc.contributor.authorAdam, Thomas N
dc.contributor.authorLeake, Gerard
dc.contributor.authorCoolbaugh, Douglas
dc.contributor.authorBradley, Jonathan DB
dc.contributor.authorWatts, Michael R
dc.date.accessioned2021-10-27T20:28:56Z
dc.date.available2021-10-27T20:28:56Z
dc.date.issued2017
dc.identifier.urihttps://hdl.handle.net/1721.1/135711
dc.description.abstract©2017 Optical Society of America. We report ultra-narrow-linewidth erbium-doped aluminum oxide (Al2O3:Er3+) distributed feedback (DFB) lasers with a wavelength-insensitive silicon-compatible waveguide design. The waveguide consists of five silicon nitride (SiNx) segments buried under silicon dioxide (SiO2) with a layer Al2O3:Er3+ deposited on top. This design has a high confinement factor (> 85%) and a near perfect (> 98%) intensity overlap for an octavespanning range across near infra-red wavelengths (950-2000 nm). We compare the performance of DFB lasers in discrete quarter phase shifted (QPS) cavity and distributed phase shifted (DPS) cavity. Using QPS-DFB configuration, we obtain maximum output powers of 0.41 mW, 0.76 mW, and 0.47 mW at widely spaced wavelengths within both the C and L bands of the erbium gain spectrum (1536 nm, 1566 nm, and 1596 nm). In a DPS cavity, we achieve an order of magnitude improvement in maximum output power (5.43 mW) and a side mode suppression ratio (SMSR) of > 59.4 dB at an emission wavelength of 1565 nm. We observe an ultra-narrow linewidth of ΔνDPS = 5.3 ± 0.3 kHz for the DPS-DFB laser, as compared to ΔνQPS = 30.4 ± 1.1 kHz for the QPS-DFB laser, measured by a recirculating selfheterodyne delayed interferometer (R-SHDI).
dc.language.isoen
dc.publisherThe Optical Society
dc.relation.isversionof10.1364/OE.25.013705
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
dc.sourceOSA Publishing
dc.titleUltra-narrow-linewidth Al2O3:Er3+ lasers with a wavelength-insensitive waveguide design on a wafer-scale silicon nitride platform
dc.typeArticle
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronics
dc.relation.journalOptics Express
dc.eprint.versionFinal published version
dc.type.urihttp://purl.org/eprint/type/JournalArticle
eprint.statushttp://purl.org/eprint/status/PeerReviewed
dc.date.updated2019-07-16T14:07:24Z
dspace.orderedauthorsPurnawirman, ; Li, N; Magden, ES; Singh, G; Singh, N; Baldycheva, A; Hosseini, ES; Sun, J; Moresco, M; Adam, TN; Leake, G; Coolbaugh, D; Bradley, JDB; Watts, MR
dspace.date.submission2019-07-16T14:07:27Z
mit.journal.volume25
mit.journal.issue12
mit.metadata.statusAuthority Work and Publication Information Needed


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