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dc.contributor.authorGuo, Yuhao
dc.contributor.authorXu, Lijuan
dc.contributor.authorJafari, Zeinab
dc.contributor.authorAgarwal, Anu
dc.contributor.authorKimerling, Lionel C
dc.contributor.authorLi, Guifang
dc.contributor.authorMichel, Jurgen
dc.contributor.authorZhang, Lin
dc.date.accessioned2021-11-10T16:32:06Z
dc.date.available2021-11-10T13:42:15Z
dc.date.available2021-11-10T16:32:06Z
dc.date.issued2018-02
dc.identifier.isbn9781510615670
dc.identifier.isbn9781510615687
dc.identifier.issn0277-786X
dc.identifier.issn1996-756X
dc.identifier.urihttps://hdl.handle.net/1721.1/138103.3
dc.description.abstract© 2018 SPIE. Group-velocity dispersion (GVD) engineering is vital to many nonlinear optical phenomena and has been widely used for nonlinear optics. Aiming at different applications, one need to control and engineer the sign, value, slope of dispersion and the number of zero-dispersion wavelengths (ZDWs). In this work, we demonstrate generation of 5 ZDWs in a new type of bilayer waveguides. Outer layer of this waveguide can be formed by depositing without etching. Material combinations are Ge23Sb7S70 (n≈2.2) and Ge28Sb12Se60 (n≈2.6). In this waveguide, an extremely wideband-low and flat dispersion can be obtained from 2.6 to 15.5 μm (2.6 octaves).en_US
dc.language.isoen
dc.publisherSPIEen_US
dc.relation.isversionofhttp://dx.doi.org/10.1117/12.2291331en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleTwo-octave dispersion flattening with five zero-dispersion wavelengths in the mid-IRen_US
dc.typeArticleen_US
dc.identifier.citation2018. "Two-octave dispersion flattening with five zero-dispersion wavelengths in the mid-IR."en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMIT Materials Research Laboratoryen_US
dc.relation.journalPhotonic and Phononic Properties of Engineered Nanostructures VIIIen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dc.date.updated2019-09-20T18:10:57Z
dspace.orderedauthorsYuhao Guo, Lijuan Xu, Zeinab Jafari, Anu M. Agarwal, Lionel C. Kimerling, Guifang Li, Jurgen Michel, Lin Zhangen_US
dspace.date.submission2019-09-20T18:10:59Z
mit.metadata.statusReady for Final Reviewen_US


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