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dc.contributor.authorLee, Youngbin
dc.contributor.authorCanales, Andres
dc.contributor.authorLoke, Gabriel
dc.contributor.authorKanik, Mehmet
dc.contributor.authorFink, Yoel
dc.contributor.authorAnikeeva, Polina
dc.date.accessioned2022-07-18T17:38:33Z
dc.date.available2022-05-11T16:49:23Z
dc.date.available2022-07-18T17:38:33Z
dc.date.issued2020-11
dc.date.submitted2020-09
dc.identifier.issn2374-7943
dc.identifier.issn2374-7951
dc.identifier.urihttps://hdl.handle.net/1721.1/142481.2
dc.description.abstract© Multimaterial fibers engineered to integrate glasses, metals, semiconductors, and composites found applications in ubiquitous sensing, biomedicine, and robotics. The longitudinal symmetry typical of fibers, however, limits the density of functional interfaces with fiber-based devices. Here, thermal drawing and photolithography are combined to produce a scalable method for deterministically breaking axial symmetry within multimaterial fibers. Our approach harnesses a two-step polymerization in thiol-epoxy and thiol-ene photopolymer networks to create a photoresist compatible with high-throughput thermal drawing in atmospheric conditions. This, in turn, delivers meters of fiber that can be patterned along the length increasing the density of functional points. This approach may advance applications of fiber-based devices in distributed sensors, large area optoelectronic devices, and smart textiles.en_US
dc.language.isoen
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/acscentsci.0c01188en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAmerican Chemical Societyen_US
dc.titleSelectively Micro-Patternable Fibers via In-Fiber Photolithographyen_US
dc.typeArticleen_US
dc.identifier.citationLee, Youngbin, Canales, Andres, Loke, Gabriel, Kanik, Mehmet, Fink, Yoel et al. 2020. "Selectively Micro-Patternable Fibers via In-Fiber Photolithography." ACS Central Science, 6 (12).en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronics
dc.contributor.departmentMcGovern Institute for Brain Research at MIT
dc.contributor.departmentMassachusetts Institute of Technology. Department of Brain and Cognitive Sciences
dc.contributor.departmentMassachusetts Institute of Technology. Institute for Soldier Nanotechnologies
dc.relation.journalACS Central Scienceen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-05-11T16:46:52Z
dspace.orderedauthorsLee, Y; Canales, A; Loke, G; Kanik, M; Fink, Y; Anikeeva, Pen_US
dspace.date.submission2022-05-11T16:46:54Z
mit.journal.volume6en_US
mit.journal.issue12en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work Neededen_US


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