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dc.contributor.authorSimons, Philipp
dc.contributor.authorTorres, Kierstin P.
dc.contributor.authorRupp, Jennifer L. M.
dc.date.accessioned2022-05-16T19:04:13Z
dc.date.available2022-05-16T17:13:42Z
dc.date.available2022-05-16T19:04:13Z
dc.date.issued2022-04
dc.date.submitted2021-10
dc.identifier.issn2050-7488
dc.identifier.issn2050-7496
dc.identifier.urihttps://hdl.handle.net/1721.1/142550.2
dc.description.abstract<jats:p>Ceria thin films deposited by spray pyrolysis show a strong preferential 〈200〉 orientation after annealing corresponding to the {100} facet of high catalytic activity. This texture correlates with an unusually strong blue shift of the Raman F<jats:sub>2g</jats:sub> peak.</jats:p>en_US
dc.language.isoen
dc.publisherRoyal Society of Chemistry (RSC)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1039/d1ta09115hen_US
dc.rightsCreative Commons Attribution-Noncommercialen_US
dc.rights.urihttps://creativecommons.org/licenses/by-nc/3.0/en_US
dc.sourceRoyal Society of Chemistryen_US
dc.titleDeposition parameters and Raman crystal orientation measurements of ceria thin films deposited by spray pyrolysisen_US
dc.typeArticleen_US
dc.identifier.citationSimons, Philipp, Torres, Kierstin P and Rupp, Jennifer LM. 2022. "Deposition parameters and Raman crystal orientation measurements of ceria thin films deposited by spray pyrolysis." Journal of Materials Chemistry A, 10 (16).en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.relation.journalJournal of Materials Chemistry Aen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-05-16T16:54:58Z
dspace.orderedauthorsSimons, P; Torres, KP; Rupp, JLMen_US
dspace.date.submission2022-05-16T16:55:00Z
mit.journal.volume10en_US
mit.journal.issue16en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work Neededen_US


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