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dc.contributor.authorVaartstra, Geoffrey
dc.contributor.authorLu, Zhengmao
dc.contributor.authorGrossman, Jeffrey C
dc.contributor.authorWang, Evelyn N
dc.date.accessioned2022-05-17T19:00:44Z
dc.date.available2022-05-17T19:00:44Z
dc.date.issued2021
dc.identifier.urihttps://hdl.handle.net/1721.1/142571
dc.language.isoen
dc.publisherAIP Publishingen_US
dc.relation.isversionof10.1063/5.0072800en_US
dc.rightsCreative Commons Attribution 4.0 International Licenseen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0en_US
dc.sourceAIPen_US
dc.titleNumerical validation of the dusty-gas model for binary diffusion in low aspect ratio capillariesen_US
dc.typeArticleen_US
dc.identifier.citationVaartstra, Geoffrey, Lu, Zhengmao, Grossman, Jeffrey C and Wang, Evelyn N. 2021. "Numerical validation of the dusty-gas model for binary diffusion in low aspect ratio capillaries." Physics of Fluids, 33 (12).
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineering
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.relation.journalPhysics of Fluidsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-05-17T18:55:36Z
dspace.orderedauthorsVaartstra, G; Lu, Z; Grossman, JC; Wang, ENen_US
dspace.date.submission2022-05-17T18:55:38Z
mit.journal.volume33en_US
mit.journal.issue12en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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