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dc.contributor.authorXu, Lijuan
dc.contributor.authorGuo, Yuhao
dc.contributor.authorWang, Jing
dc.contributor.authorHan, Zhaohong
dc.contributor.authorLiu, Henan
dc.contributor.authorMichel, Jurgen
dc.contributor.authorKimerling, Lionel C
dc.contributor.authorZhang, Lin
dc.date.accessioned2022-05-18T13:43:34Z
dc.date.available2022-05-18T13:43:34Z
dc.date.issued2021
dc.identifier.urihttps://hdl.handle.net/1721.1/142575
dc.description.abstract© 2013 IEEE. To mitigate the temperature sensitivity of photonic devices, materials with a negative thermo-optical coefficient (TOC) are integrated to optical waveguides. However, previously reported waveguides are made athermal at only one wavelength. In this paper, we theoretically propose a new broadband athermal waveguide, which consists of TiO2 with a negative TOC and SiC with a positive TOC in its core. This composite core shows a near-zero broadband effective TOC, i.e., ±1 × 10-6/K over a 780-nm bandwidth from 1280 to 2060 nm. Furthermore, it also has low anomalous dispersion, from 66 to 329 ps/nm/km in the same wavelength range. This new athermal waveguide, when used to form microresonators, enables us to achieve broadband nonlinear applications with negligible intra-cavity thermal dynamics on a chip. We also show that the proposed waveguide can be tightly bent without suffering from a large bending loss/substrate leakage, which is suitable for dense integration.en_US
dc.language.isoen
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionof10.1109/ACCESS.2020.3048152en_US
dc.rightsCreative Commons Attribution 4.0 International Licenseen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0en_US
dc.sourceIEEEen_US
dc.titleBroadband Athermal Waveguides and Resonators with Low Anomalous Dispersionen_US
dc.typeArticleen_US
dc.identifier.citationXu, Lijuan, Guo, Yuhao, Wang, Jing, Han, Zhaohong, Liu, Henan et al. 2021. "Broadband Athermal Waveguides and Resonators with Low Anomalous Dispersion." IEEE Access, 9.
dc.relation.journalIEEE Accessen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-05-18T13:26:19Z
dspace.orderedauthorsXu, L; Guo, Y; Wang, J; Han, Z; Liu, H; Michel, J; Kimerling, LC; Zhang, Len_US
dspace.date.submission2022-05-18T13:26:21Z
mit.journal.volume9en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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