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dc.contributor.authorKim, Hyunseok
dc.contributor.authorLu, Kuangye
dc.contributor.authorLiu, Yunpeng
dc.contributor.authorKum, Hyun S
dc.contributor.authorKim, Ki Seok
dc.contributor.authorQiao, Kuan
dc.contributor.authorBae, Sang-Hoon
dc.contributor.authorLee, Sangho
dc.contributor.authorJi, You Jin
dc.contributor.authorKim, Ki Hyun
dc.contributor.authorPaik, Hanjong
dc.contributor.authorXie, Saien
dc.contributor.authorShin, Heechang
dc.contributor.authorChoi, Chanyeol
dc.contributor.authorLee, June Hyuk
dc.contributor.authorDong, Chengye
dc.contributor.authorRobinson, Joshua A
dc.contributor.authorLee, Jae-Hyun
dc.contributor.authorAhn, Jong-Hyun
dc.contributor.authorYeom, Geun Young
dc.contributor.authorSchlom, Darrell G
dc.contributor.authorKim, Jeehwan
dc.date.accessioned2022-06-15T17:15:08Z
dc.date.available2022-06-15T17:15:08Z
dc.date.issued2021
dc.identifier.urihttps://hdl.handle.net/1721.1/143448
dc.description.abstractRemote epitaxy has drawn attention as it offers epitaxy of functional materials that can be released from the substrates with atomic precision, thus enabling production and heterointegration of flexible, transferrable, and stackable freestanding single-crystalline membranes. In addition, the remote interaction of atoms and adatoms through two-dimensional (2D) materials in remote epitaxy allows investigation and utilization of electrical/chemical/physical coupling of bulk (3D) materials via 2D materials (3D-2D-3D coupling). Here, we unveil the respective roles and impacts of the substrate material, graphene, substrate-graphene interface, and epitaxial material for electrostatic coupling of these materials, which governs cohesive ordering and can lead to single-crystal epitaxy in the overlying film. We show that simply coating a graphene layer on wafers does not guarantee successful implementation of remote epitaxy, since atomically precise control of the graphene-coated interface is required, and provides key considerations for maximizing the remote electrostatic interaction between the substrate and adatoms. This was enabled by exploring various material systems and processing conditions, and we demonstrate that the rules of remote epitaxy vary significantly depending on the ionicity of material systems as well as the graphene-substrate interface and the epitaxy environment. The general rule of thumb discovered here enables expanding 3D material libraries that can be stacked in freestanding form.en_US
dc.language.isoen
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionof10.1021/ACSNANO.1C03296en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceDOE repositoryen_US
dc.titleImpact of 2D–3D Heterointerface on Remote Epitaxial Interaction through Grapheneen_US
dc.typeArticleen_US
dc.identifier.citationKim, Hyunseok, Lu, Kuangye, Liu, Yunpeng, Kum, Hyun S, Kim, Ki Seok et al. 2021. "Impact of 2D–3D Heterointerface on Remote Epitaxial Interaction through Graphene." ACS Nano, 15 (6).
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineering
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronics
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratories
dc.relation.journalACS Nanoen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-06-15T17:09:43Z
dspace.orderedauthorsKim, H; Lu, K; Liu, Y; Kum, HS; Kim, KS; Qiao, K; Bae, S-H; Lee, S; Ji, YJ; Kim, KH; Paik, H; Xie, S; Shin, H; Choi, C; Lee, JH; Dong, C; Robinson, JA; Lee, J-H; Ahn, J-H; Yeom, GY; Schlom, DG; Kim, Jen_US
dspace.date.submission2022-06-15T17:09:45Z
mit.journal.volume15en_US
mit.journal.issue6en_US
mit.licenseOPEN_ACCESS_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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