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dc.contributor.authorAriyarathna, Isuru R
dc.contributor.authorDuan, Chenru
dc.contributor.authorKulik, Heather J
dc.date.accessioned2022-09-19T16:53:10Z
dc.date.available2022-09-19T16:53:10Z
dc.date.issued2022
dc.identifier.urihttps://hdl.handle.net/1721.1/145492
dc.description.abstract<jats:p> Knowledge of the chemical bonding of HfO and HfB ground and low-lying electronic states provides essential insights into a range of catalysts and materials that contain Hf–O or Hf–B moieties. Here, we carry out high-level multi-reference configuration interaction theory and coupled cluster quantum chemical calculations on these systems. We compute full potential energy curves, excitation energies, ionization energies, electronic configurations, and spectroscopic parameters with large quadruple- ζ and quintuple- ζ quality correlation consistent basis sets. We also investigate equilibrium chemical bonding patterns and effects of correlating core electrons on property predictions. Differences in the ground state electron configuration of HfB(X<jats:sup>4</jats:sup>[Formula: see text]<jats:sup>−</jats:sup>) and HfO(X<jats:sup>1</jats:sup>[Formula: see text]<jats:sup>+</jats:sup>) lead to a significantly stronger bond in HfO than HfB, as judged by both dissociation energies and equilibrium bond distances. We extend our analysis to the chemical bonding patterns of the isovalent HfX (X = O, S, Se, Te, and Po) series and observe similar trends. We also note a linear trend between the decreasing value of the dissociation energy (D<jats:sub>e</jats:sub>) from HfO to HfPo and the singlet–triplet energy gap ([Formula: see text]E<jats:sub>S–T</jats:sub>) of the molecule. Finally, we compare these benchmark results to those obtained using density functional theory (DFT) with 23 exchange–correlation functionals spanning multiple rungs of “Jacob’s ladder.” When comparing DFT errors to coupled cluster reference values on dissociation energies, excitation energies, and ionization energies of HfB and HfO, we observe semi-local generalized gradient approximations to significantly outperform more complex and high-cost functionals. </jats:p>en_US
dc.language.isoen
dc.publisherAIP Publishingen_US
dc.relation.isversionof10.1063/5.0090128en_US
dc.rightsCreative Commons Attribution 4.0 International licenseen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceAmerican Institute of Physics (AIP)en_US
dc.titleUnderstanding the chemical bonding of ground and excited states of HfO and HfB with correlated wavefunction theory and density functional approximationsen_US
dc.typeArticleen_US
dc.identifier.citationAriyarathna, Isuru R, Duan, Chenru and Kulik, Heather J. 2022. "Understanding the chemical bonding of ground and excited states of HfO and HfB with correlated wavefunction theory and density functional approximations." The Journal of Chemical Physics, 156 (18).
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemistryen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineeringen_US
dc.relation.journalThe Journal of Chemical Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-09-19T16:41:47Z
dspace.orderedauthorsAriyarathna, IR; Duan, C; Kulik, HJen_US
dspace.date.submission2022-09-19T16:41:52Z
mit.journal.volume156en_US
mit.journal.issue18en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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